3,4-Diethyl-dihydro-furan-2-one | 90370-85-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3,4-Diethyl-dihydro-furan-2-one
• 英文别名: 3,4-Diethyloxolan-2-one
• CAS: 90370-85-7
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: SLPJGNMZYBXRDL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  [(E)-but-2-enyl] 2-bromobutanoate 在 偶氮二异丁腈 、 三正丁基氢锡 作用下， 以 苯 为溶剂， 生成 3,4-Diethyl-dihydro-furan-2-one
  参考文献：
  名称：

  Direct butyrolactone production using tin hydride

  摘要：

  DOI：

  10.1016/s0040-4039(00)99361-4

文献信息

• CHEMICAL LIQUID, CHEMICAL LIQUID HOUSING BODY, RESIST PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR CHIPS
  申请人：FUJIFILM Corporation

  公开号：EP3862815A1

  公开（公告）日：2021-08-11

  The present invention provides a chemical liquid which makes it possible to obtain a resist pattern while inhibiting pattern interval variation in a case where the chemical liquid is used as a developer or rinsing solution. The present invention also provides a chemical liquid storage body, a resist pattern forming method, and a semiconductor chip manufacturing method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing n-butyl acetate and isobutyl acetate, in which a content of the n-butyl acetate is 99.000% to 99.999% by mass with respect to a total mass of the chemical liquid, and a content of the isobutyl acetate is 1.0 to 1,000 mass ppm with respect to the total mass of the chemical liquid.

  本发明提供了一种化学液体，在将该化学液体用作显影液或漂洗液的情况下，可以在获得抗蚀剂图案的同时抑制图案间隔的变化。本发明还提供了一种化学液体储存体、一种抗蚀剂图案形成方法和一种半导体芯片制造方法。根据本发明的一个实施例，化学液体是含有醋酸正丁酯和醋酸异丁酯的化学液体，其中醋酸正丁酯的含量占化学液体总质量的 99.000% 至 99.999%，醋酸异丁酯的含量占化学液体总质量的 1.0 至 1,000 质量 ppm。
• BELLETIRE, J. L.;MAHMOODI, N. O., TETRAHEDRON LETT., 30,(1989) N3, C. 4363-4366
  作者：BELLETIRE, J. L.、MAHMOODI, N. O.

  DOI：——

  日期：——
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130189621A1

  公开（公告）日：2013-07-25

  A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R 1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R 2 represents a methyl group or a trifluoromethyl group.
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150378257A1

  公开（公告）日：2015-12-31

  According to one example of the present application, there is provided a pattern forming method including: (i) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a specific resin and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) exposing the film; and (iii) developing the film exposed, by using an organic solvent-containing developer to form a negative pattern.
• US7575846B2
  申请人：——

  公开号：US7575846B2

  公开（公告）日：2009-08-18