The invention provides a resist composition which comprises a polymer (a) having structural units with an acid-labile group, and a radiation-sensitive compound (b) which forms an acid upon exposure to activated radiation, wherein the polymer (a) is a polymer obtained by polymerizing 10 to 100 wt. % of a (meth)acrylic ester (i) having, as an alcohol residue, an allyl group with at least two substituent groups and 0 to 90 wt. % of a monomer (ii) copolymerizable with the (meth)acrylic ester, and has excellent sensitivity, resolution and heat resistance, and a pattern forming process making use of the resist composition.
本发明提供了一种抗蚀组合物,其包括具有酸敏感基团的结构单元的聚合物(a)和辐射敏感化合物(b),该辐射敏感化合物(b)在暴露于激活辐射下形成酸,其中聚合物(a)是通过聚合10至100重量%的(甲基)
丙烯酸酯(i)获得的聚合物,其具有至少两个取代基的烯丙基醇残基作为醇残基,并且0至90重量%的与(甲基)
丙烯酸酯共聚的单体(ii),并具有优异的敏感性,分辨率和耐热性,以及利用抗蚀组合物制备图案的过程。