NAKAI, T.;MIKAMI, K.;TAYA, S.;FUJITA, Y., J. AMER. CHEM. SOC., 1981, 103, N 21, 6492-6494
作者:NAKAI, T.、MIKAMI, K.、TAYA, S.、FUJITA, Y.
DOI:——
日期:——
MONOMER, POLYMER AND COMPOSITION FOR PHOTORESIST
申请人:Kim Deog-Bae
公开号:US20080070161A1
公开(公告)日:2008-03-20
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C
1
˜C
25
alkyl group with or without an ether group, or a substituted or unsubstituted C
4
˜C
25
hydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.
US7604919B2
申请人:——
公开号:US7604919B2
公开(公告)日:2009-10-20
[2,3]-Wittig rearrangement of unsymmetrical bis-allylic ethers. Facile method for regio- and stereoselective synthesis of 1,5-dien-3-ols