A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance.
The composition comprises (A) an anthracene derivative of the following formula (1), (B) a photoacid generator comprising a sulfonimide compound, and, (C) a resin containing an acid-dissociable group,
wherein R
1
is a hydrogen atom or a monovalent organic group, R
2
is a monovalent organic group, e is an integer of 0-3, and f is an integer of 0-8.
The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less.
提供了一种含有低升华性能的基于
蒽醌类
羧酸组分和其他组分具有良好相容性的正电调辐射敏感
树脂组合物。该组合物表现出
化学放大的正电调光阻的最佳辐射透射可控性,特别是对深紫外线的有效响应,有效控制在高折射率基板上由于电阻膜厚度波动而导致的电阻图案线宽变化,并表现出优异的焦深允许度。该组合物包括(A)以下式(1)的
蒽醌衍
生物,(B)包括磺
酰亚胺化合物的光酸发生剂,以及(C)含有酸可解离基团的
树脂,其中R1是氢原子或一价有机基团,R2是一价有机基团,e为0-3的整数,f为0-8的整数。组分(A)中的
金属杂质含量以总离子含量表示,最好是5000 ppb或更低。