A method of rendering a substrate catalytic to electroless metal deposition comprising the steps of: (a) depositing a ligating chemical agent on the substrate, which is capable of both binding to the substrate and ligating to an electroless plating catalyst; and (b) ligating the electroless plating catalyst to the ligating chemical agent,
wherein the ligating chemical agent has the chemical structure:
wherein n and m are each between about 1 and about 100.
一种使基底催化电无电镀的方法,包括以下步骤:(a) 在基底上沉积能够既与基底结合又与电无电镀催化剂配位的配位
化学试剂; (b) 将电无电镀催化剂配位到配位
化学试剂上,其中配位
化学试剂具有以下
化学结构:其中n和m均在约1到约100之间。