chlorocopper;quinoline | 15947-49-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 喹啉及其衍生物
• 英文名称: chlorocopper;quinoline
• CAS: 15947-49-6
• 化学式: C₉H₇N*Cl*Cu
• 分子量: 228.16
• InChiKey: OKFDQISJXZBTOR-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.92
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  12.9
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  copper(l) chloride 、 喹啉 以 乙腈 为溶剂， 生成 chlorocopper;quinoline
  参考文献：
  名称：

  Healy, Peter C.; Skelton, Brian W.; Waters, A. Fiona, Australian Journal of Chemistry, 1991, vol. 44, p. 1049 - 1060

  摘要：

  DOI：

文献信息

• Polymer electrolyte membrane and fuel cell using the same
  申请人：Saito Shin

  公开号：US20050287410A1

  公开（公告）日：2005-12-29

  A polymer electrolyte membrane having excellent mechanical natures is provided. The polymer electrolyte membrane has an elastic modulus at 23° C. and a relative humidity of 50% of 400 MPa to 900 MPa and comprises at least one polymer, all of which have an aromatic ring on their main chain, at least one of which has an aliphatic chain on its main chain and at least one of which is a polymer electrolyte.

  提供了一种具有优异机械性质的聚合物电解质膜。该聚合物电解质膜在23℃和相对湿度为50％时的弹性模量为400 MPa至900 MPa，并且包括至少一种聚合物，其主链上都具有芳香环，其中至少一种具有主链上的脂肪链，至少一种是聚合物电解质。
• Block copolymer and use thereof
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20040138387A1

  公开（公告）日：2004-07-15

  The present invention provides a block copolymer comprising at least one segment having an acid group and at least one segment substantially free from an acid group, wherein the segment having an acid group comprises a repeating unit which is a substituted repeating unit represented in the formula (1) with an acid group, —(Ar 1 —X 1 —Ar 2 —X 2 )—  (1), and in the formula(1), X 1 and X 2 being each independently —O— or —S—, Ar 1 and Ar 2 being each independently an aromatic group selected from the groups represented by the following formulae (2) to (4). 1

  本发明提供了一种嵌段共聚物，其包括至少一个具有酸基团的片段和至少一个基本不含酸基团的片段，其中具有酸基团的片段包括一个重复单元，该重复单元是表示为公式（1）中的取代重复单元，其中含有酸基团，-（Ar1-X1-Ar2-X2）-（1），在公式（1）中，X1和X2各自独立地为-O-或-S-，Ar1和Ar2各自独立地为以下公式（2）到（4）所表示的芳香族群中选择的芳香族群。
• Poly(arylene ether) polymer with low temperature crosslinking grafts and adhesive comprising the same
  申请人：——

  公开号：US20030171527A1

  公开（公告）日：2003-09-11

  A poly(arylene ether) polymer includes polymer repeat units of the following structure: —(O—Ar 1 —O—Ar 2 —O—) m —(—O—Ar 3 —O—Ar 4 —O) n — where Ar 1 , Ar 2 , Ar 3 , and Ar 4 are identical or different aryl radicals, m is 0 to 1, n is 1-m, and at least one of the aryl radicals is grafted to at least one unsaturated group that is non-aromatic and is adapted to crosslink at a curing temperature below 200° C. without producing volatiles during curing and without providing functional groups aftercuring. Cured films containing the polymer can have a Tg from 160° C. to 180° C., a dielectric constant below 2.7 with frequency independence, and a maximum moisture absorption of less than 0.17 wt %. Accordingly, the polymer is especially useful in interlayer dieletrics and in die-attach adhesives.

  聚芳基醚聚合物包括以下结构的聚合物重复单元： -（O-Ar 1 -O-Ar 2 -O-) m -(-O-Ar 3 -O-Ar 4 -O) n - 其中 Ar 1 ，Ar 2 、Ar 3 和 Ar 4 为相同或不同的芳基，m 为 0 至 1，n 为 1-m，且至少一个芳基接枝到至少一个不饱和基团上，该不饱和基团为非芳香族基团，可在低于 200 摄氏度的固化温度下交联，固化过程中不产生挥发物，固化后不提供官能团。含有这种聚合物的固化薄膜的 Tg 值为 160°C 至 180°C，介电常数低于 2.7 且与频率无关，最大吸湿率低于 0.17 wt %。因此，这种聚合物特别适用于层间压电材料和压接粘合剂。
• Poly(arylene ether) polymer with low temperature or UV crosslinking grafts and dielectric comprising the same
  申请人：Burgoyne Franklin William

  公开号：US20050240002A1

  公开（公告）日：2005-10-27

  Poly(arylene ether) polymers are provided having polymer repeat units of the following structure: wherein Ar 1 , Ar 2 , Ar 3 , and Ar 4 are identical or different aryl radicals, m is 0 to 1, n is 1-m, and at least one of G 1 , G 2 , G 3 , G 4 , G 5 , G 6 , G 7 and G 8 is a hydroxyalkyl furan group. Thin films of the polymer and methods of making the polymer are also provided.

  聚芳基醚聚合物具有以下结构的聚合物重复单元： 其中 Ar 1 ，Ar 2 Ar 3 和 Ar 4 为相同或不同的芳基，m 为 0 至 1，n 为 1-m，G 1 , G 2 , G 3 , G 4 , G 5 , G 6 , G 7 和 G 8 是羟基烷基呋喃基团。此外，还提供了这种聚合物的薄膜和制造这种聚合物的方法。
• Novel poly(arylene ether) dielectrics
  申请人：Chartered Semiconductor Manufacturing Ltd.

  公开号：US20040068082A1

  公开（公告）日：2004-04-08

  The present invention relates to poly(arylene ethers) used as low k dielectric layers in electronic applications and articles containing such poly(arylene ethers) comprising the structure: 1 wherein n=5 to 10000 and monovalent Ar 1 and divalent Ar 2 are selected from a group of heteroaromatic compounds that incorporate O, N, Se, S, or Te or combinations of the aforesaid elements, including but not limited to: 2