2-acetylterephthalic acid | 90772-00-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-acetylterephthalic acid
• 英文别名: acetyl-terephthalic acid；Acetyl-terephthalsaeure
• CAS: 90772-00-2
• 化学式: C₁₀H₈O₅
• 分子量: 208.171
• InChiKey: NDOAKEALAQOQQP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  91.7
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2-acetylterephthalic acid 、 4-戊氧基苯酚 在 4-二甲氨基吡啶 、 N,N'-二环己基碳二亚胺 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 以85%的产率得到di(4-n-amyloxyphenyl) 2-acetylterephthalate
  参考文献：
  名称：

  Mesomorphic compounds with a rigid T-shaped mesogenic fragment

  摘要：

  Mesomorphic polyesters with a rigid T-shaped mesogenic fragment were prepared and studied by polarization optical microscopy, differential scanning calorimetry, and IR and H-1 NMR spectroscopy. An increase in the length of aliphatic substituents in the mesogenic fragment leads to a change from the nematic type of the mesophase to the smectic type.

  DOI：

  10.1134/s1070363207080087
• 作为产物：
  描述：

  trichloroacetyl-terephthalic acid 在 palladium on activated charcoal 、 Lindlar's catalyst 、 乙醇 作用下， 生成 2-acetylterephthalic acid
  参考文献：
  名称：

  Feist, Justus Liebigs Annalen der Chemie, 1932, vol. 496, p. 99,115

  摘要：

  DOI：

文献信息

• [EN] PRMT5 INHIBITORS<br/>[FR] INHIBITEURS DE PRMT5
  申请人：CTXT PTY LTD

  公开号：WO2017153518A1

  公开（公告）日：2017-09-14

  A compound of formula (Ia), (Ib) or (Ic) wherein: n is 1 or 2; RN is H or Me; R1 is optionally one or more halo or methyl groups; R2a and R2b are independently selected from the group consisting of: (i) F; (ii) H; (iii) Me; and (iv) CH2OH; R2c and R2d (if present) are independently selected from the group consisting of: (i) F; (ii) H; (iii) Me; and (iv) CH2OH; R3a and R3b are independently selected from H and Me; R4a is selected from OH, -NH2, -C(=O)NH2, and -CH2OH; R4b is either H or Me; X is either N or CH; R7 is selected from H and C1-4 alkyl; (a) one of R8a, R8b, R8c and R8d is selected from H, halo, C1-4 alkyl, C1-4 alkoxy, NHC1-4 alkyl; (b) another of R8a, R8b, R8c and R8d is selected from H, C1-4 alkyl, C1-4 fluoroalkyl, C3-6 cycloalkyl, C5-6 heteroaryl, C5-6 heteroaryl methyl, C4-6 heterocyclyl, C4-6 heterocyclyl methyl, phenyl, benzyl, halo, amido, amidomethyl, acylamido, acylamidomethyl, C1-4 alkyl ester, C1-4 alkyl ester methyl, C1-4 alkyl carbamoyl, C1-4 alkyl carbamoyl methyl, C1-4 alkylacyl, C1-4 alkylacyl methyl, phenylcarbonyl, carboxy, carboxymethyl, ether, amino, amino methyl, sulfonamido, sulfonamino, sulfone, sulfoxide, nitrile and nitrilemethyl; (c) the others of R8a, R8b, R8c and R8d are H.

  化合物的化学式(Ia)，(Ib)或(Ic)，其中：n为1或2；RN为H或Me；R1是可选择的一个或多个卤素或甲基基团；R2a和R2b分别从以下组中选择：(i) F；(ii) H；(iii) Me；和(iv) CH2OH；R2c和R2d（如果存在）分别从以下组中选择：(i) F；(ii) H；(iii) Me；和(iv) CH2OH；R3a和R3b分别从H和Me中选择；R4a从OH，-NH2，-C(=O)NH2和-CH2OH中选择；R4b为H或Me；X为N或CH；R7从H和C1-4烷基中选择；(a)R8a，R8b，R8c和R8d中的一个从H，卤素，C1-4烷基，C1-4烷氧基，NHC1-4烷基中选择；(b)R8a，R8b，R8c和R8d中的另一个从H，C1-4烷基，C1-4氟代烷基，C3-6环烷基，C5-6杂环芳基，C5-6杂环芳基甲基，C4-6杂环烷基，C4-6杂环烷基甲基，苯基，苄基，卤素，酰胺基，酰胺基甲基，酰胺基，酰胺基甲基，C1-4烷基酯，C1-4烷基酯甲基，C1-4烷基氨基，C1-4烷基氨基甲基，C1-4烷基酰基，C1-4烷基酰基甲基，苯基羰基，羧基，羧甲基，醚，氨基，氨基甲基，磺酰胺基，磺酰氨基，砜，亚砜，腈和腈甲基中选择；(c)R8a，R8b，R8c和R8d中的其他为H。
• Water-dispersed electrodeposition solution for forming insulating film
  申请人：MITSUBISHI MATERIALS CORPORATION

  公开号：US10465080B2

  公开（公告）日：2019-11-05

  A water-based electrodeposition dispersion for forming an insulating film includes: polymer particles; an organic solvent; a basic compound; and water, wherein the polymer particles include polyamic acid having a predetermined structural unit, and a volume-based median diameter (D50) of the polymer particles is 0.08 μm to 0.7 μm.

  一种用于形成绝缘膜的水基电沉积分散体包括：聚合物颗粒、有机溶剂、碱性化合物和水，其中聚合物颗粒包括具有预定结构单元的聚酰胺，聚合物颗粒的体积中值直径（D50）为 0.08 μm 至 0.7 μm。
• PRMT5 inhibitors
  申请人：CTXT PTY LTD

  公开号：US10961256B2

  公开（公告）日：2021-03-30

  A compound of formula (Ia), (Ib) or (Ic) wherein: n is 1 or 2; RN is H or Me; R1 is optionally one or more halo or methyl groups; R2a and R2b are independently selected from the group consisting of: (i) F; (ii) H; (iii) Me; and (iv) CH2OH; R2c and R2d (if present) are independently selected from the group consisting of: (i) F; (ii) H; (iii) Me; and (iv) CH2OH; R3a and R3b are independently selected from H and Me; R4a is selected from OH, —NH2, —C(═O)NH2, and —CH2OH; R4b is either H or Me; X is either N or CH; R7 is selected from H and C1-4 alkyl; (a) one of R8a, R8b, R8c and R8d is selected from H, halo, C1-4 alkyl, C1-4 alkoxy, NHC1-4 alkyl; (b) another of R8a, R8b, R8c and R8d is selected from H, C1-4 alkyl, C1-4 fluoroalkyl, C3-6 cycloalkyl, C5-6 heteroaryl, C5-6 heteroaryl methyl, C4-6 heterocyclyl, C4-6 heterocyclyl methyl, phenyl, benzyl, halo, amido, amidomethyl, acylamido, acylamidomethyl, C1-4 alkyl ester, C1-4 alkyl ester methyl, C1-4 alkyl carbamoyl, C1-4 alkyl carbamoyl methyl, C1-4 alkylacyl, C1-4 alkylacyl methyl, phenylcarbonyl, carboxy, carboxymethyl, ether, amino, amino methyl, sulfonamido, sulfonamino, sulfone, sulfoxide, nitrile and nitrilemethyl; (c) the others of R8a, R8b, R8c and R8d are H.

  式(Ia)、(Ib)或(Ic)化合物 其中： n 是 1 或 2；RN 是 H 或 Me；R1 是任选的一个或多个卤代或甲基；R2a 和 R2b 独立选自以下组：(i) F；(ii) H；(iii) Me；和 (iv) CH2OH；R2c 和 R2d（如存在）独立选自以下组(R3a 和 R3b 独立选自 H 和 Me；R4a 选自 OH、-NH2、-C(═O)NH2 和 -CH2OH；R4b 为 H 或 Me；(a) R8a、R8b、R8c 和 R8d 中的一个选自 H、卤代物、C1-4 烷基、C1-4 烷氧基、NHC1-4 烷基；(b) R8a、R8b、R8c 和 R8d 中的另一个选自 H、C1-4 烷基、C1-4 氟烷基、C3-6 环烷基、C5-6 杂芳基、C5-6 杂芳基甲基、C4-6 杂环烷基、C4-6 杂环烷基甲基、苯基、苄基、卤代、氨基、酰胺甲基、酰氨基、酰酰胺甲基、C1-4烷基酯、C1-4烷基酯甲基、C1-4烷基氨基甲酰基、C1-4烷基氨基甲酰基甲基、C1-4烷基酰基、C1-4烷基酰基甲基、苯基羰基、羧基、羧甲基、醚、氨基、氨基甲基、磺酰氨基、磺酰氨基、砜、亚砜、腈和腈甲基；(c) R8a、R8b、R8c 和 R8d 中的其它物质为 H。
• PRMT5 INHIBITORS
  申请人：Ctxt Pty Ltd

  公开号：EP3426640A1

  公开（公告）日：2019-01-16
• POLYMER COMPOSITIONS AND METHODS
  申请人：Allen Scott D.

  公开号：US20140072806A1

  公开（公告）日：2014-03-13

  The present invention encompasses polymer compositions comprising aliphatic polycarbonate chains containing functional groups that increase the polymer's ability to wet or adhere to inorganic materials. In certain embodiments, chain ends of the aliphatic polycarbonates are modified to introduce silicon-containing functional groups, boron-containing functional groups, phosphorous-containing functional groups, sulfonic acid groups or carboxylic acid groups.