[(methylcyclopentadienyl)Na(THF)] | 1130886-80-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: [(methylcyclopentadienyl)Na(THF)]
• 英文别名: Na(THF)(monomethylcyclopentadienyl)
• CAS: 1130886-80-4
• 化学式: C₄H₈O*C₆H₇*Na
• 分子量: 174.218
• InChiKey: QVMSKYWMROYBIC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.49
• 重原子数：
  12.0
• 可旋转键数：
  0.0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  9.23
• 氢给体数：
  0.0
• 氢受体数：
  1.0

反应信息

• 作为反应物：
  描述：

  zirconium tetrachloride bis(tetrahydrofuran) complex 、 [(methylcyclopentadienyl)Na(THF)] 以 四氢呋喃 为溶剂， 以60%的产率得到双(甲基环戊二烯)二氯化锆
  参考文献：
  名称：

  Synthesis of Zirconium Guanidinate Complexes and the Formation of Zirconium Carbonitride via Low Pressure CVD

  摘要：

  Thin films of zirconium carbonitride have been deposited on glass at 600 degrees C from two novel guanidinate precursors: [ZrCp'{eta(2)-((PrN)-Pr-i)(2)CNMe2}(2)Cl] and [ZrCp'(2){eta(2)-((PrN)-Pr-i)(2)CNMe2}Cl] (2) (Cp' = monomethylcyclopentadienyl). Both compounds 1 and 2 were structurally characterized by X-ray crystallography. The films grown via low pressure chemical vapor deposition (LPCVD) from compound 1 were mirror-like with a red-brown sheen whereas those from 2 were gray. Chlorine was present in the films although the levels were no higher than 3 at.%. These two compounds clearly show how the coordination environment around the metal center affects the composition of the film, as films from 1 were nitrogen rich and those from 2 were carbon rich. The films were uniform, adhesive, abrasion resistant, conformal, and hard, being resistant to scratching with steel and brass scalpels.

  DOI：

  10.1021/om801053y

文献信息

• Bis(η-cyclopentadienyl)imidomolybdenum compounds
  作者：Malcolm L. H. Green、Peter C. Konidaris、Despo M. Michaelidou、Philip Mountford

  DOI：10.1039/dt9950000155

  日期：——

  The mono(η-cyclopentadienyl)imide compounds [Mo(η-C5H4R)(NR′)Cl2](R, R′= H, R″; Me, Pri; Me, R″; or Pri, R″; R″= C6H3Me2-2,6) and the new bis(η-cyclopentadienyl)imide compounds [Mo(η-C5H4R)2(NR′)](R, R′= Me, But; H, But; H, Pri; H, Ph; H, R″; Me, Pri; Me, Ph; Me, R″; Pri, But; or Pri, R″), [Mo(η-C5H5)(η-C5H4Pri)(NBut)], [Mo(η3-C9H7)(η-C5H4Pri)(NBut)] and [Mo(η- C5H4Me)2Me(NBut)]X (X = I or BF4) have

  单（η环戊二烯基）酰亚胺化合物[沫（η-C 5 H ^ 4 R）（NR'）氯2 ]（R，R'= H，R“; Me中，镨我; Me中，R”;或Pr我，R“; R”= C 6 H ^ 3我2 -2,6）和新的双（η环戊二烯基）酰亚胺化合物[沫（η-C 5 H ^ 4 R）2（NR'）]（R， R'= Me，Bu t ; H，Bu t ; H，Pr i ; H，Ph; H，R''; Me，Pr i ; Me，Ph; Me，R''; Pr i，Bu t ;或Pr i，R“），[沫（η-C 5 H ^ 5）（η-C 5ħ 4镨我）（NBU吨）]，[沫（η 3 -C 9 ħ 7）（η-C 5 H ^ 4镨我）（NBU吨）]和[沫（η-ç 5 ħ 4 Me）的2已准备好Me（NBu t）] X（X = I或BF 4）。盐[沫（η-C 5 H ^ 4 ME）（PME 3）2（NBU吨）] [C 5 H ^
• Bis(cyclopentadienyl) zirconium(IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD
  作者：Stephen E. Potts、Claire J. Carmalt、Christopher S. Blackman、Fawzi Abou-Chahine、Noémi Leick、W.M.M. Kessels、Hywel O. Davies、Peter N. Heys

  DOI：10.1016/j.ica.2009.07.004

  日期：2010.4

  Low pressure chemical vapour deposition (LPCVD) of [ZrCp2(NMe2)(2)] (1), [ZrCp2(eta(2)-MeNCH2CH2NMe)] (2), [ZrCp2'(NMe2)(2)] (3) and [ZrCp2'(NEt2)(2)] (4) (Cp = eta(5)-cyclopentadienyl, Cp' = eta(5)-monomethylcyclopentadienyl), onto glass substrates at 600 degrees C, afforded highly reflective and adhesive films of zirconium carbide and amorphous carbon. Powder XRD indicated that the films were largely amorphous, although small, broad peaks accounting for ZrC and ZrO2 were present, suggesting that the remaining carbon was due to amorphous deposits from the cyclopentadienyl ligands. SEM images showed an island-growth mechanism with distinct crevices between the concentric nodules. Plasma-enhanced atomic layer deposition (PEALD) of compounds 1 and 2 showed that the precursors were not sufficiently stable or volatile to give a good rate of film growth. (C) 2009 Elsevier B.V. All rights reserved.