4-propyltetrahydropyran-2-one | 62948-63-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 4-propyltetrahydropyran-2-one
• 英文别名: 3-n-Propylvalerolacton；4-propyloxan-2-one
• CAS: 62948-63-4
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: GDGHUPZAKGKFIE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-propyltetrahydropyran-2-one 在 lithium aluminium tetrahydride 作用下， 生成 3-propylpentane-1,5-diol
  参考文献：
  名称：

  Irwin,A.J. et al., Journal of the Chemical Society. Perkin transactions I, 1978, p. 1636 - 1642

  摘要：

  DOI：
• 作为产物：
  描述：

  (+/-)-3-n-propylcyclopentanone 在 engineered bakers' yeast cell culture YP-Gal 作用下， 以27%的产率得到4-propyltetrahydropyran-2-one
  参考文献：
  名称：

  使用工程面包酵母对2和3取代的环戊酮进行对映和区域选择性的Bayerer-Villiger氧化。

  摘要：

  DOI：

  10.1021/jo980737v

文献信息

• Use of a Semihollow-Shaped Triethynylphosphane Ligand for Efficient Formation of Six- and Seven-Membered Ring Ethers through Gold(I)-Catalyzed Cyclization of Hydroxy-Tethered Propargylic Esters
  作者：Hideto Ito、Ayumi Harada、Hirohisa Ohmiya、Masaya Sawamura

  DOI：10.1002/adsc.201200949

  日期：2013.3.11

  The formation of six‐ and seven‐membered ring ethers from hydroxy‐tethered propargylic esters was efficiently catalyzed by a cationic gold(I) complex with a semihollow‐shaped triethynylphosphane ligand. This gold catalysis showed a tolerance toward the reactions of primary, secondary, and tertiary alcohol substrates with various substitution patterns. A sterically congested 2,2,6,6‐tetraalkyl‐substituted

  带有半空心形状的三乙炔基膦配体的阳离子金（I）配合物可有效地催化羟基拴住的炔丙基酯形成六元和七元环醚。这种金催化显示出对具有各种取代方式的伯，仲和叔醇底物反应的耐受性。得到了有用的收率的2,2,6,6-四烷基取代的四氢吡喃衍生物以及6,6-和7,6-稠合的双环二醚的空间拥挤状态。此外，金催化还适用于磺酰胺连接的炔丙基酯反应生成哌啶衍生物。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030219680A1

  公开（公告）日：2003-11-27

  A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.

  提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂，但在酸的作用下变得碱溶，以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元，其中R1通常是氢原子，而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。
• Resin composition
  申请人：Mitsui Chemicals, Inc.

  公开号：EP1041118A2

  公开（公告）日：2000-10-04

  There are here disclosed a resin composition comprising a block or a graft copolymer (A) having a polyamino acid as a hydrophilic segment (a-1) and a degradable polymer as a hydrophobic segment (a-2), and a resin (B); and a method of accelerating the hydrolysis of a resin and inhibiting the heat deterioration thereof by mixing this copolymer (A) with the resin (B).

  本发明公开了一种树脂组合物，该树脂组合物包括嵌段或接枝共聚物（A）（其中聚氨基酸为亲水段（a-1），可降解聚合物为疏水段（a-2））和树脂（B））；以及一种通过将该共聚物（A）与树脂（B）混合来加速树脂水解并抑制其热劣化的方法。
• FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2003148A2

  公开（公告）日：2008-12-17

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2325695A1

  公开（公告）日：2011-05-25

  A radiation-sensitive resin composition includes (A) a polymer, (B) a photoacid generator, (C) an acid diffusion controller, and (D) a solvent, the polymer (A) including a repeating unit (a-1) shown by the following general formula (a-1), and the acid diffusion controller (C) including at least one base selected from (C-1) a base shown by the following general formula (C-1) and (C-2) a photodegradable base. wherein R1 individually represent a hydrogen atom or the like, R represents a monovalent group shown by the above general formula (a'), R19 represents a chain-like hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain-like hydrocarbon group having 1 to 30 carbon atoms or the like, m and n are integers from 0 to 3 (m+n=1 to 3), and R2 and R3 individually represent a monovalent chain-like hydrocarbon group having 1 to 20 carbon atoms or the like, provided that the two R2 may bond to form a ring structure.

  一种辐射敏感树脂组合物包括（A）聚合物、（B）光酸发生器、（C）酸扩散控制器和（D）溶剂，聚合物（A）包括如下通式（a-1）所示的重复单元（a-1），酸扩散控制器（C）包括至少一种选自（C-1）如下通式（C-1）所示的碱和（C-2）可光降解碱的碱。 其中 R1 单独代表氢原子或类似物，R 代表上述通式（a'）所示的一价基团，R19 代表具有 1 至 5 个碳原子或类似物的链状烃基，A 代表具有 1 至 30 个碳原子或类似物的二价链状烃基，m 和 n 是 0 至 3 的整数（m+n=1 至 3），R2 和 R3 单独代表具有 1 至 20 个碳原子或类似物的一价链状烃基，条件是两个 R2 可以键合形成环状结构。