3-甲氧基-3-甲基-戊-1-烯 | 134777-62-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 3-甲氧基-3-甲基-戊-1-烯
• 英文名称: 3-methoxy-3-methyl-pent-1-ene
• 英文别名: 3-Methoxy-3-methyl-pent-1-en；3-Methoxy-3-methyl-1-pentene；3-methoxy-3-methylpent-1-ene
• CAS: 134777-62-1
• 化学式: C₇H₁₄O
• 分子量: 114.188
• InChiKey: ZOECPUYYGPRQJH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  甲醇 、 3-甲氧基-3-甲基-戊-1-烯 、 硫酸 生成 1-甲氧基-3-甲基-戊-2-烯 、 3-methyl-1,3-pentadiene
  参考文献：
  名称：

  Nasarow; Aserbajew; Raktschejewa, Zhurnal Obshchei Khimii, 1948, vol. 18, p. 408,411

  摘要：

  DOI：
• 作为产物：
  描述：

  甲醇 、 3-甲基-1-戊烯-3-醇 在 硫酸 作用下， 生成 1-甲氧基-3-甲基-戊-2-烯 、 3-甲氧基-3-甲基-戊-1-烯
  参考文献：
  名称：

  Nasarow; Aserbajew; Raktschejewa, Zhurnal Obshchei Khimii, 1948, vol. 18, p. 408,411

  摘要：

  DOI：

文献信息

• POLYMER COMPOSITIONS
  申请人：Zhao Ming

  公开号：US20100015441A1

  公开（公告）日：2010-01-21

  Polymers are described that are prepared from di and mono-functional silicone and silane monomers of Formula 1 in which Y represents a direct bond or a oxy group; R 1 represents an optionally substituted organo group with at least one double bond which optionally may be an activated unsaturated moiety such as a (meth)acrylate group: for example 1-n-propoxy(acrylate) or ethenyl; and R 2 and R 3 each separately, and independently within each optional repeat unit, represent an optionally substituted hydrocarbo, hydrocarbo(oxy), hydrosilico and/or hydrosilico(oxy) groups; or example, methyl; or trimethylsiloxy; R 4 independently represents an optionally substituted organo group with at least one double bond (such as R 1 above) an optionally substituted hydrocarbo, and/or hydrosilico group for example trimethylsilyl or ethenyl; and n is from about 0 to about 2000; preferably from about 1 to about 100, for example n is 1. Such polymer precursors can be used to prepare flow modifying agents, defoamers and/or pressure sensitive adhesives.
• RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
  申请人：Watanabe Takeru

  公开号：US20110195362A1

  公开（公告）日：2011-08-11

  There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
• US8227086B2
  申请人：——

  公开号：US8227086B2

  公开（公告）日：2012-07-24
• US8835092B2
  申请人：——

  公开号：US8835092B2

  公开（公告）日：2014-09-16
• Nasarow; Aserbajew; Raktschejewa, Zhurnal Obshchei Khimii, 1948, vol. 18, p. 408,411
  作者：Nasarow、Aserbajew、Raktschejewa

  DOI：——

  日期：——