Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition.
In the above Chemical Formula 1,
A, A′, X, Y, l, m and n are the same as described in the detailed description.
本发明公开了一种用以下
化学式1表示的硬掩膜组分单体、包括该单体的硬掩膜组合物以及使用该硬掩膜组合物形成图案的方法。在上述
化学式1中,A、A'、X、Y、l、m和n与详细说明中所描述的相同。