SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160334702A1
公开(公告)日:2016-11-17
A salt represented by formula (I):
wherein Q
1
and Q
2
independently represent a fluorine atom or a C
1
to C
6
perfluoroalkyl group, R
1
and R
2
in each occurrence independently represent a hydrogen atom, a fluorine atom or a C
1
to C
6
perfluoroalkyl group, z represents an integer of 0 to 6, X
1
represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R
1
)(R
2
) or C(Q
1
)(Q
2
), A
1
represents a C
4
to C
24
hydrocarbon group having a C
4
to C
18
divalent alicyclic hydrocarbon moiety, A
2
represents a C
2
to C
12
divalent hydrocarbon group, R
3
and R
4
independently represent a hydrogen atom or a C
1
to C
6
monovalent saturated hydrocarbon group, R
5
represents a hydrogen atom, a fluorine atom, or a C
1
to C
6
alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z
+
represents an organic cation.
Desymmetrization of cyclohexanes by site- and stereoselective C–H functionalization
作者:Jiantao Fu、Zhi Ren、John Bacsa、Djamaladdin G. Musaev、Huw M. L. Davies
DOI:10.1038/s41586-018-0799-2
日期:2018.12
Carbon–hydrogen (C–H) bonds have long been considered unreactive and are inert to traditional chemical reagents, yet new methods for the transformation of these bonds are continually being developed1–9. However, it is challenging to achieve such transformations in a highly selective manner, especially if the C–H bonds are unactivated10 or not adjacent to a directing group11–13. Catalyst-controlled
SULFAMIDE AND SULFAMATE DERIVATIVES AS HISTONE DEACETYLASE INHIBITORS
申请人:Smil David
公开号:US20070293530A1
公开(公告)日:2007-12-20
This invention relates to compounds for the inhibition of histone deacetylase. More particularly, the invention provides for compounds of formula (I), and racemic and scalemic mixtures, diastereomers and enantiomers thereof:
or an N-oxide, hydrate, solvate, pharmaceutically acceptable salt, prodrug or complex thereof, wherein Y, L, Z, W, M, R
a
, R
b
and R
c
are as defined in the specification.
这项发明涉及用于抑制组蛋白去乙酰化酶的化合物。更具体地,该发明提供了符合式(I)的化合物,以及它们的外消旋和内消旋混合物、非对映体和对映体:
或其N-氧化物、水合物、溶剂合物、药学上可接受的盐、前药或其复合物,其中Y、L、Z、W、M、R
a
、R
b
和R
c
如规范中所定义。
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160244400A1
公开(公告)日:2016-08-25
A compound represented by formula (I):
wherein R
1
represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom,
L
1
represents a C1-C8 fluorinated alkanediyl group,
X
1
represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L
1
, and
R
2
represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20180065925A1
公开(公告)日:2018-03-08
A salt represented by formula (I):
wherein R
1
and R
2
independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group,
X
1
represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and
A
−
represents an organic anion.