(+)(S)-(1-methoxy-ethyl)-cyclohexane | 67810-86-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (+)(S)-(1-methoxy-ethyl)-cyclohexane
• 英文别名: (+)(S)-(1-Methoxy-aethyl)-cyclohexan；(1-methoxyethyl)cyclohexane；[(1S)-1-methoxyethyl]cyclohexane
• CAS: 67810-86-0
• 化学式: C₉H₁₈O
• 分子量: 142.241
• InChiKey: ZNPFXBUKHUJVKH-QMMMGPOBSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  1-cyclohexylethanol 在 乙醚 、 氢化钾 作用下， 生成 (+)(S)-(1-methoxy-ethyl)-cyclohexane
  参考文献：
  名称：

  Levene; Harris, Journal of Biological Chemistry, 1936, vol. 113, p. 55,57

  摘要：

  DOI：

文献信息

• NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160131972A1

  公开（公告）日：2016-05-12

  Sulfonium and iodonium salts of a carboxylate having an aromatic ring to which a nitrogen-containing alkyl or cyclic structure is attached are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.

  一种具有芳香环的羧酸酯的砜和碘化物盐，其中连接有含氮烷基或环状结构，是一种新颖的化合物。该砜盐在抗蚀组合物中作为酸扩散控制剂，有助于形成具有高分辨率、改善MEF、LWR和DOF的良好轮廓图案。
• ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160320698A1

  公开（公告）日：2016-11-03

  An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.

  具有特定结构的阴离子基团的醇盐是一种有效的光酸发生剂。包含该醇盐的抗蚀组合物具有兼容性和减少酸扩散的优点，并形成具有良好灵敏度和MEF、矩形度以及最小缺陷的图案。
• SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180099928A1

  公开（公告）日：2018-04-12

  A sulfonium compound having formula (1) is provided wherein R 1 , R 2 and R 3 are a C 1 -C 20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved LWR and pattern collapse.

  提供了一个具有式（1）的磺鎓化合物，其中R1，R2和R3是C1-C20单价含有杂原子的碳氢基团，p = 0-5，q = 0-5，r = 0-4。利用光刻技术处理含有该磺鎓化合物的抗蚀剂组合物，可形成具有改善的LWR和图案崩溃的抗蚀剂图案。
• SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150086926A1

  公开（公告）日：2015-03-26

  A carboxylic acid sulfonium salt having formula (1) is provided wherein R 0 is hydrogen or a monovalent hydrocarbon group, R 01 and R 02 are hydrogen or a monovalent hydrocarbon group, at least one of R 0 , R 01 , and R 02 has a cyclic structure, L is a single bond or forms an ester, sulfonate, carbonate or carbamate bond with the vicinal oxygen atom, R 2 , R 3 and R 4 are monovalent hydrocarbon groups. The sulfonium salt functions as a quencher in a resist composition, enabling to form a pattern of good profile with minimal LWR, rectangularity, and high resolution.

  提供了具有公式（1）的羧酸磺酸盐，其中R0为氢或一价烃基，R01和R02为氢或一价烃基，R0、R01和R02中至少有一个具有环状结构，L为单键或与邻位氧原子形成酯、磺酸盐、碳酸酯或氨基甲酸酯键，R2、R3和R4为一价烃基。磺酸盐在抗蚀剂组合物中起到淬灭剂的作用，能够形成具有良好轮廓、最小LWR、矩形度和高分辨率的图案。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170299963A1

  公开（公告）日：2017-10-19

  A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

  具有公式（1）所表示的onium盐结构的单体会产生与抗蚀剂组分完全兼容的聚合物。包括该聚合物的抗蚀剂组合物具有降低酸扩散、高灵敏度、高分辨率、良好的光刻特性平衡以及较少的缺陷等优点，对于精确微图案制备非常有效。