1-(methoxymethyl)oxycarbonyl-1,1-difluoro-2-butyl methacrylate | 1092693-71-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 1-(methoxymethyl)oxycarbonyl-1,1-difluoro-2-butyl methacrylate
• 英文别名: methoxymethyl 2,2-difluoro-3-(2-methylprop-2-enoyloxy)pentanoate
• CAS: 1092693-71-4
• 化学式: C₁₁H₁₆F₂O₅
• 分子量: 266.242
• InChiKey: DXMBQBOFCFJFEW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  18
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.64
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  1-ethoxycarbonyl-1,1-difluoro-2-butyl methacrylate 在 水 、 sodium hydroxide 作用下， 以 四氢呋喃 为溶剂， 反应 1.5h， 生成 1-(methoxymethyl)oxycarbonyl-1,1-difluoro-2-butyl methacrylate
  参考文献：
  名称：

  Polymerizable Fluorine-Containing Compound

  摘要：

  一种可聚合的含氟化合物，其化学式为（1），其中R1表示可聚合的双键含有基团，R2表示酸敏感保护基团，R3表示氟原子或含氟烷基团，W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并包含由式（2）表示的重复单元，其中R2、R3和W如上所述，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物，能够形成透明的曝光光线图案，并具有优异的矩形度。

  公开号：

  US20110098500A1

文献信息

• Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20080311507A1

  公开（公告）日：2008-12-18

  Disclosed is a fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  本发明涉及一种含氟化合物，其化学式为（1），其中R1代表可聚合的双键含基团，R2代表酸易保护基，R3代表氟原子或含氟烷基团，W代表双价连结基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）所表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可以组成环。该聚合物化合物可提供一种抗蚀剂组合物，能够形成对曝光光线透明且在矩形度方面优越的图案。
• Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same
  申请人：Central Glass Company, Limited

  公开号：US07887990B2

  公开（公告）日：2011-02-15

  Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  本发明涉及一种含氟化合物，其化学式为（1），其中R1代表可聚合的双键含基团，R2代表酸敏感保护基团，R3代表氟原子或含氟烷基团，W代表双价连接基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可组成环。该聚合物化合物可提供一种抗蚀剂组合物，其能够形成对曝光光线透明且在矩形度方面优越的图案。
• Polymerizable fluorine-containing compound
  申请人：Isono Yoshimi

  公开号：US08592622B2

  公开（公告）日：2013-11-26

  A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  公式（1）所表示的一种可聚合的含氟化合物，其中R1表示可聚合的双键含基团，R2表示酸敏保护基团，R3表示氟原子或含氟烷基团，W表示双价连接基团。该化合物可提供一种分子量为1,000-1,000,000的含氟聚合物化合物，其中包含由公式（2）所表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可以结合形成环。该聚合物化合物可提供一种光刻胶组合物，能够形成透明的曝光光线并具有优异的矩形性。
• POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD
  申请人：JSR Corporation

  公开号：EP2309332A1

  公开（公告）日：2011-04-13

  A positive-tone radiation-sensitive composition is used for a resist pattern-forming method that includes double exposure as a given step, and includes (B) a polymer that includes an acid-labile group and a crosslinkable group, (C) a photoacid generator, and (D) a solvent.

  一种正色调辐射敏感性组合物用于抗蚀剂图案形成方法，该方法包括作为给定步骤的双重曝光，并包括 (B) 包含可酸标记基团和可交联基团的聚合物、(C) 光酸发生器和 (D) 溶剂。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN
  申请人：MATSUDA Yasuhiko

  公开号：US20120094234A1

  公开（公告）日：2012-04-19

  The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R 1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R 2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R 3 represents a hydrogen atom or a monovalent organic group.