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2,6-bis(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-4-methylphenol | 22247-59-2

中文名称
——
中文别名
——
英文名称
2,6-bis(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-4-methylphenol
英文别名
3-[3-[3-(hydroxymethyl)-5-methylsalicyl]-5-methylsalicyl]-2-hydroxy-5-methylbenzylalcohol;4-methyl-2,6-bis(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)phenol;4-Hydroxy-1-methyl-3.5-bis-(2-hydroxy-5-methyl-3-hydroxymethyl-benzyl)-benzol;2,6-Bis[[2-hydroxy-3-(hydroxymethyl)-5-methylphenyl]methyl]-4-methylphenol
2,6-bis(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-4-methylphenol化学式
CAS
22247-59-2
化学式
C25H28O5
mdl
——
分子量
408.494
InChiKey
NSKWILAGSIGXQA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5.1
  • 重原子数:
    30
  • 可旋转键数:
    6
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.28
  • 拓扑面积:
    101
  • 氢给体数:
    5
  • 氢受体数:
    5

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US10017664B2
    公开(公告)日:2018-07-10
    Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.
    用于形成具有高干法蚀刻抗性、抗扭曲性并具有良好的平整性和嵌入性能的抗蚀底层膜形成组合物,包括通过使含有芳香环的有机化合物A和至少具有两个含酚羟基的芳香烃环团的醛B反应而获得的树脂,并具有芳香烃环团通过三级碳原子键合的结构。醛B可以是化合物的化学式(1): 所得的树脂可能具有化学式(2)的单元结构: Ar1和Ar2各自是C6-40芳基团。含有芳香环的有机化合物A可能是芳香胺或含酚羟基的化合物。该组合物可能进一步含有溶剂、酸和/或酸发生剂,或交联剂。用于半导体生产的形成抗蚀图案,包括通过将抗蚀底层膜形成组合物涂覆在半导体衬底上并对其进行烘烤来形成抗蚀底层膜。
  • Facile Syntheses of Homothiacalixarenes
    作者:Kazuaki Ito、Yayoi Yamamori、Yoshihiro Ohba、Tyo Sone
    DOI:10.1080/00397910008087137
    日期:2000.4
    Abstract Homothiacalixarenes were conveniently prepared from the reactions of bis(chloromethyl)phenol-formaldehyde trimers with alkanedithiols in good yields.
    摘要 高硫杯芳烃可由双(氯甲基)苯酚-甲醛三聚体与链烷二硫醇反应以良好的收率方便地制备。
  • Facile syntheses of homothia- and homoazacalixarenes
    作者:Kazuaki Ito、Takanori Nagai、Yoshihiro Ohba、Tyo Sone
    DOI:10.1002/jhet.5570370516
    日期:2000.9
    2-ethanedithiol in high yields. In contrast, the simi lar reactions of the trimers with 1,3-propanedithiol instead of 1,2-ethanedithiol gave 1:1 macrocycles, hexahomodithiacalix[3]arenes, in good yields. Homoazacalixarenes were also prepared from the analogous reactions using piperazines. These macrocycles adopt a cone-like form as a preferable conformation in solution.
    从双(氯甲基)苯酚甲醛三聚体与1,2-乙二硫醇的2:2环化反应中,可以方便地制备出十ahomoththiacalix [6]芳烃。相反,三聚体与1,3-丙二硫酚而不是1,2-乙二硫醇的相似反应产生了1:1大环,即六高二硫杂杯[3]芳烃,收率很高。还使用哌嗪从类似的反应中制备了高氮杂二氮杂芳烃。这些大环化合物采用锥状形式作为溶液中的优选构象。
  • Synthesis of N,N′-bridged azacalixarenes
    作者:Hiroyuki Takemura、Katsuya Sako、Tesuo Iwanaga、Akane Tatsumi、Yukako Mogami、Hiromi Watanabe、Miho Aoki、Shiho Yûki、Yuri Hayano、Mirei Itaka
    DOI:10.1016/j.tet.2018.03.002
    日期:2018.4
    The one-pot reaction between bis(hydroxymethyl)phenol derivatives and diamines or triamines afforded novel azacalixarenes with bridged structures. Basket-type macrocycles of cone conformations, molecules that contained two aza[3.1.1.1]calixarene skeletons connected by a chain, or novel saucer-type azacalixarenes were obtained from the reaction. Structures of some of them were determined by crystallographic
    双(羟甲基)苯酚衍生物与二胺或三胺之间的一锅法反应提供了具有桥联结构的新型氮杂卡萨基芳烃。从反应中获得了圆锥构象的篮型大环,包含两个通过链连接的氮杂[3.1.1.1]杯芳烃骨架的分子或新型的碟型氮杂杯芳烃。其中一些的结构通过晶体学分析确定。
  • THE REACTION OF HEXAALKYLPHOSPHOROUS TRIAMIDES WITH OLIGOPHENOLS
    作者:Dirk Weber、Wolf D. Habicher、E. E. Nifantev、A. T. Teleshev、A. A. Zhdanov、V. K. Belsky
    DOI:10.1080/10426509908037029
    日期:1999.1.1
    stencal hindered compounds 2a-f up to 315°C leads to the corresponding bicyclic phosphites 3a-d while the non-hindered phosphocins 2g-i react in refluxing xylene to give phosphites 3e-g. The phosphocin 2i formed another phosphocin 2i* during heating to 90°C in THF by “wandering” of the phosphorus moiety. The bicyclic phosphites 3h and 3i were prepared starting from tetraphenol 1h and pentaphenol 1i
    摘要 六烷基磷三酰胺在与低聚苯酚 1a-i 的反应中以良好的产率形成 6-二烷基氨基-12H-二苯并[dg] [1,3,2] 二氧杂磷酸酯 2a-i。将 stencal 受阻化合物 2a-f 加热至 315°C 会产生相应的双环亚磷酸酯 3a-d,而非受阻磷酸酯 2g-i 在回流的二甲苯中反应生成亚磷酸酯 3e-g。在 THF 中加热至 90°C 期间,通过磷部分的“游动”,磷酸素 2i 形成了另一种磷酸素 2i*。双环亚磷酸酯3h和3i是由四苯酚1h和五苯酚1i与六乙基三酰胺在回流二甲苯中反应制备的。二磷酸化的三苯酚 4 和四苯酚 5 在相应的苯酚与 2 eq. 的反应中形成。六烷基磷三酰胺。
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