(2S)-2-{[(allyloxy)carbonyl]amino}-4-oxo-2,4-diphenylbutanoic acid | 860617-78-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 直链 1,3-二芳基丙烷
• 英文名称: (2S)-2-{[(allyloxy)carbonyl]amino}-4-oxo-2,4-diphenylbutanoic acid
• CAS: 860617-78-3
• 化学式: C₂₀H₁₉NO₅
• 分子量: 353.375
• InChiKey: CGXUAEWTCWJDDD-FQEVSTJZSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.15
• 重原子数：
  26.0
• 可旋转键数：
  8.0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.15
• 拓扑面积：
  92.7
• 氢给体数：
  2.0
• 氢受体数：
  4.0

反应信息

• 作为反应物：
  描述：

  (2S)-2-{[(allyloxy)carbonyl]amino}-4-oxo-2,4-diphenylbutanoic acid 在 水 、 碘 、 碳酸氢钠 作用下， 以 N,N-二甲基甲酰胺 、 乙腈 为溶剂， 反应 49.0h， 生成 methyl (2S)-2-amino-4-oxo-2,4-diphenylbutanoate
  参考文献：
  名称：

  Mild non-transition metal catalyzed deprotection of N-allyloxycarbonyl amines

  摘要：

  A synthesis of mehyl (2S)-2-amino-2,4-diphenylbutanoate has been achieved via a novel one-pot non-transition metal mediated deprotection of the N-allyloxycarbonyl amine using iodine in wet acetonitrile. The applicability of this transformation has been demonstrated by deprotecting a variety of N-allyloxycarbonyl amines, alpha-aminomethyl esters and simple N-allyloxycarbonyl alkyl amines. Deprotection occurs in high yield (82-93%) without erosion of the optical purity of the chiral substrates. (c) 2005 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2005.04.064
• 作为产物：
  描述：

  allyl (2S,4S)-5-oxo-4-(2-oxo-2-phenylethyl)-2,4-diphenyl-1,3-oxazolidine-3-carboxylate 在 lithium hydroxide 作用下， 以 甲醇 为溶剂， 反应 16.0h， 生成 (2S)-2-{[(allyloxy)carbonyl]amino}-4-oxo-2,4-diphenylbutanoic acid
  参考文献：
  名称：

  Mild non-transition metal catalyzed deprotection of N-allyloxycarbonyl amines

  摘要：

  A synthesis of mehyl (2S)-2-amino-2,4-diphenylbutanoate has been achieved via a novel one-pot non-transition metal mediated deprotection of the N-allyloxycarbonyl amine using iodine in wet acetonitrile. The applicability of this transformation has been demonstrated by deprotecting a variety of N-allyloxycarbonyl amines, alpha-aminomethyl esters and simple N-allyloxycarbonyl alkyl amines. Deprotection occurs in high yield (82-93%) without erosion of the optical purity of the chiral substrates. (c) 2005 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2005.04.064