1-(3-Hydroxy-4-methyl-pentyl)-cyclohexanol | 136175-32-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(3-Hydroxy-4-methyl-pentyl)-cyclohexanol
• 英文别名: 1-(3-Hydroxy-4-methylpentyl)cyclohexan-1-ol
• CAS: 136175-32-1
• 化学式: C₁₂H₂₄O₂
• 分子量: 200.321
• InChiKey: XWDOXPTXHBPOOK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1-(1-羟基-环己基)-4-甲基-戊-1-炔-3-醇 在 chromium(VI) oxide 、 硫酸 、 乙酸乙酯 、 丙酮 、 铂 作用下， 生成 1-(3-Hydroxy-4-methyl-pentyl)-cyclohexanol
  参考文献：
  名称：

  Mondon, Justus Liebigs Annalen der Chemie, 1954, vol. 585, p. 43,65

  摘要：

  DOI：

文献信息

• Monomer, polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10915021B2

  公开（公告）日：2021-02-09

  A monomer having formula (A) is provided. RA is H, methyl or trifluoromethyl, X1 is a single bond, ether, ester or amide bond, Ra is a C1-C20 monovalent hydrocarbon group, Rb is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1≤n+m≤4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.

  提供一种具有式(A)的单体。其中 RA 是 H、甲基或三氟甲基，X1 是单键、醚键、酯键或酰胺键，Ra 是 C1-C20 单价烃基，Rb 是 H 或可酸基，X 是卤素，n 是 1 到 4 的整数，m 是 0 到 3 的整数，1≤n+m≤4。包含由单体衍生的聚合物的抗蚀剂组合物对高能辐射（尤其是紫外线）具有高灵敏度。
• Regiochemical control in the reductive cleavage of 2-alkylated oxetanes by use of trialkylaluminums. Tertiary organolithiums with .gamma.-oxy functionality
  作者：Boguslaw Mudryk、Theodore Cohen

  DOI：10.1021/jo00020a011

  日期：1991.9

  Whereas 2,2-dialkylated oxetanes are cleaved by lithium 4,4'-di-tert-butylbiphenylide to provide the primary organolithium-tertiary oxyanions, the same reaction in the presence of trialkylaluminums gives exclusively the 3-lithio-3,3-disubstituted propoxides, which are trapped by carbonyl compounds in moderate yields.
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20190079399A1

  公开（公告）日：2019-03-14

  A monomer having formula (A) is provided. R A is H, methyl or trifluoromethyl, X 1 is a single bond, ether, ester or amide bond, R a is a C 1 -C 20 monovalent hydrocarbon group, R b is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1≤n+m≤4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.
• Mondon, Justus Liebigs Annalen der Chemie, 1954, vol. 585, p. 43,65
  作者：Mondon

  DOI：——

  日期：——