Pyrazole derivatives, processes for preparation thereof and pharmaceutical composition comprising the same
申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0418845A1
公开(公告)日:1991-03-27
A compound of the formula :
wherein R1 is aryl which may be substituted with substituent(s) selected from the group consisting of lower alkyl, halogen, lower alkoxy, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, hydroxy, lower alkylsulfonyloxy, nitro, amino, lower alkylamino, acylamino and lower alkyl(acyl)amino; or a heterocyclic group; R2 is hydrogen; methyl substituted with amino, lower alkylamino, halogen or acyloxy; acyl; acylamino; cyano; halogen; lower alkylthio; lower alkylsulfinyl; or a heterocyclic group; and R3 is aryl substituted with lower alkyl, lower alkylthio, lower alkylsulfinyl, halogen, amino, lower alkylamino, acylamino, lower alkyl(acyl)amino, lower alkoxy, cyano, hydroxy or acyl; or a heterocyclic group which may be substituted with lower alkylthio, lower alkylsulfinyl or lower alkylsulfonyl; with certain provisions, pharmaceutically acceptable salts thereof, processes for their preparation and pharmaceutical compositions comprising them as an active ingredient.
一种式如下的化合物
其中 R1 是芳基,可被选自由低级烷基、卤素、低级烷氧基、低级烷硫基、低级烷基亚磺基、低级烷基磺酰基、羟基、低级烷基磺酰氧基、硝基、氨基、低级烷基氨基、酰氨基和低级烷基(酰基)氨基组成的取代基取代;或杂环基团;R2 是氢;被氨基、低级烷基氨基、卤素或酰氧基取代的甲基;酰基;酰氨基;氰基;卤素;低级烷硫基;低级烷基亚磺酰基;或杂环基团;R3 是被低级烷基、低级烷硫基、低级烷基亚磺基、卤素、氨基、低级烷基氨基、酰氨基、低级烷基(酰基)氨基、低级烷氧基、氰基、羟基或酰基取代的芳基;或可被低级烷硫基、低级烷基亚磺基或低级烷基磺酰基取代的杂环基团。