1-cyclopentylcyclopentanol | 4884-28-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-cyclopentylcyclopentanol
• 英文别名: 1-Cyclopentyl-1-cyclopentanol；1-cyclopentylcyclopentan-1-ol
• CAS: 4884-28-0
• 化学式: C₁₀H₁₈O
• 分子量: 154.252
• InChiKey: FAGXGCNYHMUVIV-UHFFFAOYSA-N

物化性质

• 沸点：
  85-87 °C(Press: 3 Torr)
• 密度：
  0.9686 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  甲酸 、 1-cyclopentylcyclopentanol 在 硫酸 作用下， 以 水 为溶剂， 反应 1.0h， 以85%的产率得到cis-decalin-9-carboxylic acid
  参考文献：
  名称：

  Rao, R. R.; Bhattacharya, S., Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 1981, vol. 20, # 3, p. 207 - 209

  摘要：

  DOI：
• 作为产物：
  描述：

  Hydroperoxide, [1,1a(2)-bicyclopentyl]-1-yl 在 palladium on activated charcoal 氢气 作用下， 生成 1-cyclopentylcyclopentanol
  参考文献：
  名称：

  Chirko,A.I., Journal of Organic Chemistry USSR (English Translation), 1966, vol. 1, p. 2023 - 2025

  摘要：

  DOI：

文献信息

• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• Low activation energy photoresist composition and process for its use
  申请人：Allen Robert David

  公开号：US20070275324A1

  公开（公告）日：2007-11-29

  The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

  本发明涉及一种辐射敏感的光刻胶组合物。该组合物包括至少两种单体的聚合物。第一种单体具有酸可裂解的三级酯基团。第二种单体是酸性单体。聚合物的酸可裂解酯基团具有惊人的低活化能，从而在印刷工艺中提高了抗蚀图像的质量。
• Low Activation Energy Photoresist Composition and Process for Its Use
  申请人：Allen Robert David

  公开号：US20110008727A1

  公开（公告）日：2011-01-13

  The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

  本发明涉及一种辐射敏感的光阻组合物。该组合物包括至少两种单体的聚合物。第一种单体具有酸可裂解的三级酯基团。第二种单体是酸性单体。聚合物的酸可裂解酯基团具有惊人的低活化能，从而在光刻工艺中获得改进的阻抗图像。
• Methods for making elastomers, elastomer compositions and related elastomers
  申请人：ALLNEX IP S.À.R.L.

  公开号：US10100223B2

  公开（公告）日：2018-10-16

  Methods of producing an elastomer are disclosed that include (I) applying an actinic radiation curable composition preferably selected from a urethane (meth)acrylate, an allophanate urethane (meth)acrylate or a lactone-containing (meth)acrylate to a substrate at a thickness of at least 0.25 mm (10 mils); (II) exposing the composition ultraviolet radiation to produce a cured film; and (III) removing the film from the substrate. Related compositions are also disclosed.

  本发明公开了生产弹性体的方法，包括：(I) 将优选选自氨基甲酸酯（甲基）丙烯酸酯、异丙酸氨基甲酸酯（甲基）丙烯酸酯或含内酯的（甲基）丙烯酸酯的阳极辐射固化组合物涂在基底上，厚度至少为 0.25 毫米（10 密耳）；(II) 对组合物进行紫外线辐射以产生固化薄膜；以及 (III) 从基底上去除薄膜。 还公开了相关的组合物。
• Process for preparing low-viscosity allophanates containing actinically curable groups
  申请人：Ludewig Michael

  公开号：US20060079660A1

  公开（公告）日：2006-04-13

  The present invention provides a process for preparing radiation-curing allophanates having residual monomer contents of less than 0.5% by weight and an NCO content of less than 1% by weight, wherein (A) compounds containing isocyanate groups, (B) hydroxy-functional compounds which contain groups which react, with polymerization, with ethylenically unsaturated compounds on exposure to actinic radiation (radiation-curing groups) and (C) optionally further compounds containing NCO-reactive groups, also optionally in the presence of a catalyst, are used to form NCO-group-containing urethanes having radiation-curing groups, which are subsequently reacted, without further addition of compounds containing isocyanate groups, in the presence of an allophanatization catalyst, the ratio of NCO groups of the compounds from A) to the OH groups of the compounds from B) and, where used, C) being 1.45:1.0 to 1.1:1.0.

  本发明提供了一种制备辐射固化异番酸盐的工艺，其残余单体含量小于 0.其中(A)含有异氰酸酯基团的化合物；(B)羟基官能团化合物，其所含的基团在聚合反应中会与乙烯基不饱和化合物在暴露于光辐射下时发生反应（辐射固化基团）；(C)可选地进一步含有 NCO 反应基团的化合物、也可选择在催化剂存在下使用，以形成具有辐射固化基团的含 NCO 基团的聚氨酯，随后在异氰酸酯催化剂存在下进行反应，无需再添加含异氰酸酯基团的化合物，A) 中化合物的 NCO 基团与 B) 和（如使用）C) 中化合物的 OH 基团的比例为 1.45:1.0 至 1.1:1.0。