[2-{二甲基(菲-9-基)甲硅烷基}苯基]甲醇 | 1398044-33-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 菲及其衍生物
• 中文名称: [2-{二甲基(菲-9-基)甲硅烷基}苯基]甲醇
• 英文名称: [2-{dimethyl(phenanthren-9-yl)silyl}phenyl]methanol
• 英文别名: {2-[Dimethyl(phenanthren-9-yl)silyl]phenyl}methanol；[2-[dimethyl(phenanthren-9-yl)silyl]phenyl]methanol
• CAS: 1398044-33-1
• 化学式: C₂₃H₂₂OSi
• 分子量: 342.513
• InChiKey: QNUSKCZRFOIHOX-UHFFFAOYSA-N

物化性质

• 沸点：
  510.8±42.0 °C(Predicted)
• 密度：
  1.14±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.31
• 重原子数：
  25
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.13
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  [2-{二甲基(菲-9-基)甲硅烷基}苯基]甲醇 、 N,N-二甲基甲酰胺 在 碘化铵 、 copper(II) nitrate trihydrate 、 氧气 作用下， 反应 35.0h， 以80%的产率得到9-腈菲
  参考文献：
  名称：

  Copper-Mediated Transformation of Organosilanes to Nitriles with DMF and Ammonium Iodide

  摘要：

  Cyanation of aryl-, diaryldimethyl-, and styrylsilanes was developed for the first time under copper-mediated oxidative conditions using ammonium iodide and DMF as the combined source of nitrogen and carbon atom of the introduced cyano unit, respectively. The reaction was observed to proceed in a two-step process: initial conversion of organosilanes to their iodo intermediates and then cyanation. This method has a broad substrate scope with high functional group tolerance.

  DOI：

  10.1021/ol400659p
• 作为产物：
  描述：

  magnesium,9H-phenanthren-9-ide,bromide 、 1,3-二氢-1,1-二甲基-2,1-苯并氧硅杂环戊二烯 以 四氢呋喃 、 乙醚 为溶剂， 生成 [2-{二甲基(菲-9-基)甲硅烷基}苯基]甲醇
  参考文献：
  名称：

  Copper-Mediated Transformation of Organosilanes to Nitriles with DMF and Ammonium Iodide

  摘要：

  Cyanation of aryl-, diaryldimethyl-, and styrylsilanes was developed for the first time under copper-mediated oxidative conditions using ammonium iodide and DMF as the combined source of nitrogen and carbon atom of the introduced cyano unit, respectively. The reaction was observed to proceed in a two-step process: initial conversion of organosilanes to their iodo intermediates and then cyanation. This method has a broad substrate scope with high functional group tolerance.

  DOI：

  10.1021/ol400659p