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7-二乙基氨基-3-噻吩甲酰基香豆素 | 77820-11-2

中文名称
7-二乙基氨基-3-噻吩甲酰基香豆素
中文别名
7-二乙氨基-3-噻吩甲酰基香豆素
英文名称
7-diethylamino-3-thenoylcoumarin
英文别名
7-(Diethylamino)-3-(thiophene-2-carbonyl)-2H-chromen-2-one;7-(diethylamino)-3-(thiophene-2-carbonyl)chromen-2-one
7-二乙基氨基-3-噻吩甲酰基香豆素化学式
CAS
77820-11-2
化学式
C18H17NO3S
mdl
——
分子量
327.404
InChiKey
HSYRYXPRQYPBBQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    138-142 °C
  • 沸点:
    533.3±50.0 °C(Predicted)
  • 密度:
    1.2165 (rough estimate)
  • 稳定性/保质期:
    遵照规定使用和储存,则不会分解。

计算性质

  • 辛醇/水分配系数(LogP):
    4.3
  • 重原子数:
    23
  • 可旋转键数:
    5
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.22
  • 拓扑面积:
    74.8
  • 氢给体数:
    0
  • 氢受体数:
    5

安全信息

  • 安全说明:
    S24/25
  • 海关编码:
    2934999090
  • 危险性防范说明:
    P261,P264,P270,P271,P280,P301+P312+P330,P302+P352,P304+P340+P312,P305+P351+P338,P332+P313,P337+P313,P362,P403+P233,P405,P501
  • 危险性描述:
    H302,H315,H319,H335

SDS

SDS:06cdb8907f0316d82d3872b9cc1083a7
查看
Name: 7-Diethylamino-3-Thenoylcoumarin Material Safety Data Sheet
Synonym: 7-(Diethylamino)-3-(2-thienylcarbonyl)-2H-1-benzopyran 2-on
CAS: 77820-11-2
Section 1 - Chemical Product MSDS Name:7-Diethylamino-3-Thenoylcoumarin Material Safety Data Sheet
Synonym:7-(Diethylamino)-3-(2-thienylcarbonyl)-2H-1-benzopyran 2-on

Section 2 - COMPOSITION, INFORMATION ON INGREDIENTS
CAS# Chemical Name content EINECS#
77820-11-2 7-Diethylamino-3-Thenoylcoumarin ca. 100 unlisted
Hazard Symbols: None Listed.
Risk Phrases: None Listed.

Section 3 - HAZARDS IDENTIFICATION
EMERGENCY OVERVIEW
The toxicological properties of this material have not been fully investigated.
Potential Health Effects
Eye:
May cause eye irritation.
Skin:
May cause skin irritation.
Ingestion:
May cause irritation of the digestive tract. The toxicological properties of this substance have not been fully investigated.
Inhalation:
May cause respiratory tract irritation. The toxicological properties of this substance have not been fully investigated.
Chronic:
No information found.

Section 4 - FIRST AID MEASURES
Eyes: Flush eyes with plenty of water for at least 15 minutes, occasionally lifting the upper and lower eyelids. Get medical aid.
Skin:
Get medical aid. Flush skin with plenty of water for at least 15 minutes while removing contaminated clothing and shoes. Wash clothing before reuse.
Ingestion:
Never give anything by mouth to an unconscious person. Get medical aid. Do NOT induce vomiting. If conscious and alert, rinse mouth and drink 2-4 cupfuls of milk or water.
Inhalation:
Remove from exposure and move to fresh air immediately. If not breathing, give artificial respiration. If breathing is difficult, give oxygen. Get medical aid.
Notes to Physician:

Section 5 - FIRE FIGHTING MEASURES
General Information:
As in any fire, wear a self-contained breathing apparatus in pressure-demand, MSHA/NIOSH (approved or equivalent), and full protective gear. During a fire, irritating and highly toxic gases may be generated by thermal decomposition or combustion.
Extinguishing Media:
Use agent most appropriate to extinguish fire. Use water spray, dry chemical, carbon dioxide, or appropriate foam.

Section 6 - ACCIDENTAL RELEASE MEASURES
General Information: Use proper personal protective equipment as indicated in Section 8.
Spills/Leaks:
Vacuum or sweep up material and place into a suitable disposal container. Clean up spills immediately, observing precautions in the Protective Equipment section. Avoid generating dusty conditions.
Provide ventilation.

Section 7 - HANDLING and STORAGE
Handling:
Wash thoroughly after handling. Remove contaminated clothing and wash before reuse. Use only in a well-ventilated area. Minimize dust generation and accumulation. Avoid contact with eyes, skin, and clothing. Keep container tightly closed. Avoid ingestion and inhalation.
Storage:
Keep container closed when not in use. Store in a tightly closed container. Store in a cool, dry, well-ventilated area away from incompatible substances. Store at temperatures below the decomposition temperature.

Section 8 - EXPOSURE CONTROLS, PERSONAL PROTECTION
Engineering Controls:
Facilities storing or utilizing this material should be equipped with an eyewash facility and a safety shower. Use adequate ventilation to keep airborne concentrations low.
Exposure Limits CAS# 77820-11-2: Personal Protective Equipment Eyes: Wear appropriate protective eyeglasses or chemical safety goggles as described by OSHA's eye and face protection regulations in 29 CFR 1910.133 or European Standard EN166.
Skin:
Wear appropriate protective gloves to prevent skin exposure.
Clothing:
Wear appropriate protective clothing to prevent skin exposure.
Respirators:
A respiratory protection program that meets OSHA's 29 CFR 1910.134 and ANSI Z88.2 requirements or European Standard EN 149 must be followed whenever workplace conditions warrant respirator use.

Section 9 - PHYSICAL AND CHEMICAL PROPERTIES

Physical State: Powder
Color: yellow
Odor: Not available.
pH: Not available.
Vapor Pressure: Not available.
Viscosity: Not available.
Boiling Point: Not available.
Freezing/Melting Point: 140 deg C
Autoignition Temperature: Not applicable.
Flash Point: 220 deg C ( 428.00 deg F)
Explosion Limits, lower: Not available.
Explosion Limits, upper: Not available.
Decomposition Temperature: 220 deg C
Solubility in water: insoluble
Specific Gravity/Density:
Molecular Formula: C18H17NO3S
Molecular Weight: 327.39

Section 10 - STABILITY AND REACTIVITY
Chemical Stability:
Stable under normal temperatures and pressures.
Conditions to Avoid:
Incompatible materials, dust generation, excess heat.
Incompatibilities with Other Materials:
Strong oxidizing agents.
Hazardous Decomposition Products:
Carbon monoxide, oxides of nitrogen, oxides of sulfur, irritating and toxic fumes and gases, carbon dioxide.
Hazardous Polymerization: Will not occur.

Section 11 - TOXICOLOGICAL INFORMATION
RTECS#:
CAS# 77820-11-2 unlisted.
LD50/LC50:
Not available.
Carcinogenicity:
7-Diethylamino-3-Thenoylcoumarin - Not listed by ACGIH, IARC, or NTP.

Section 12 - ECOLOGICAL INFORMATION


Section 13 - DISPOSAL CONSIDERATIONS
Dispose of in a manner consistent with federal, state, and local regulations.

Section 14 - TRANSPORT INFORMATION

IATA
Not regulated as a hazardous material.
IMO
Not regulated as a hazardous material.
RID/ADR
Shipping Name: Not regulated.
Hazard Class:
UN Number:
Packing group:

Section 15 - REGULATORY INFORMATION

European/International Regulations
European Labeling in Accordance with EC Directives
Hazard Symbols: Not available.
Risk Phrases:
Safety Phrases:
S 24/25 Avoid contact with skin and eyes.
S 28A After contact with skin, wash immediately with
plenty of water.
S 37 Wear suitable gloves.
S 45 In case of accident or if you feel unwell, seek
medical advice immediately (show the label where
possible).
WGK (Water Danger/Protection)
CAS# 77820-11-2: No information available.
Canada
None of the chemicals in this product are listed on the DSL/NDSL list.
CAS# 77820-11-2 is not listed on Canada's Ingredient Disclosure List.
US FEDERAL
TSCA
CAS# 77820-11-2 is not listed on the TSCA inventory.
It is for research and development use only.


SECTION 16 - ADDITIONAL INFORMATION
N/A

反应信息

  • 作为产物:
    描述:
    2-乙酰基噻吩哌啶 、 sodium hydride 作用下, 以 四氢呋喃乙醇 为溶剂, 反应 2.17h, 生成 7-二乙基氨基-3-噻吩甲酰基香豆素
    参考文献:
    名称:
    释放酮香豆素的潜力:用于可持续光驱动析氢的高效光敏剂
    摘要:
    在这项研究中,我们探索了酮香豆素作为光驱动析氢光敏剂的未开发潜力。通过合成一系列新型酮香豆素和优化反应条件,我们相对于钴肟催化剂实现了接近 4000 的显着转化率。我们的光谱和电化学研究揭示了析氢的还原猝灭机制。通过增加钴肟浓度,我们可以成功防止光敏剂的光降解,并且可以维持氢气生产长达 22 天。我们的工作表明,酮香豆素凭借其易于合成和可调节性,可以作为常用的重金属基光敏剂的有效且实用的替代品。
    DOI:
    10.1039/d3ta04450e
  • 作为试剂:
    描述:
    calcium methacrylate 、 Prop-2-enoate;zirconium(4+) 在 7-二乙基氨基-3-噻吩甲酰基香豆素 作用下, 以 甲醇二甲基亚砜 为溶剂, 生成 calcium zirconate
    参考文献:
    名称:
    3D‐Architected Alkaline‐Earth Perovskites
    摘要:
    Abstract

    3D ceramic architectures are captivating geometrical features with an immense demand in optics. In this work, an additive manufacturing (AM) approach for printing alkaline‐earth perovskite 3D microarchitectures is developed. The approach enables custom‐made photoresists suited for two‐photon lithography, permitting the production of alkaline‐earth perovskite (BaZrO3, CaZrO3, and SrZrO3) 3D structures shaped in the form of octet‐truss lattices, gyroids, or inspired architectures like sodalite zeolite, and C60 buckyballs with micrometric and nanometric feature sizes. Alkaline‐earth perovskite morphological, structural, and chemical characteristics are studied. The optical properties of such perovskite architectures are investigated using cathodoluminescence and wide‐field photoluminescence emission to estimate the lifetime rate and defects in BaZrO3, CaZrO3, and SrZrO3. From a broad perspective, this AM methodology facilitates the production of 3D‐structured mixed oxides. These findings are the first steps toward dimensionally refined high‐refractive‐index ceramics for micro‐optics and other terrains like (photo/electro)catalysis.

    DOI:
    10.1002/adma.202307077
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文献信息

  • OXIME ESTER PHOTOINITIATORS
    申请人:BASF SE
    公开号:US20180208583A1
    公开(公告)日:2018-07-26
    Compounds of the formulae (I) or (II) wherein X is A is O, S, NR 5 or CR 16 R 17 ; R 1 is for example hydrogen or C 1 -C 20 alkyl R 2 is for example hydrogen, C 1 -C 20 alkyl or C 6 -C 20 aryl R 5 for example is C 1 -C 20 alkyl; R 7 , R 8 , R 9 , R 10 and R 11 for example independently of each other are hydrogen. C 1 -C 20 alkyl, halogen, CN or NO 2 ; Ar 1 is for example unsubstituted or substituted C 6 -C 20 aryl, C 3 -C 20 heteroaryl, C 6 -C 20 aroyl, C 3 -C 20 heteroarylcarbonyl or or Ar 1 is Ar 2 is for example phenylene, all of which are unsubstituted or substituted M is for example unsubstituted or substituted C 1 -C 20 alkylene Y is a direct bond, O, S, NR 5 or CO; Z 1 is for example O or S; Z 2 is a direct bond, O, S or NR 5 ; and Q is CO or a direct bond.
    公式(I)或(II)的化合物 其中 X是 A是O, S, NR 5 或CR 16 R 17 ; R 1 例如是氢或C 1 -C 20 烷基 R 2 例如是氢, C 1 -C 20 烷基或C 6 -C 20 芳基 R 5 例如是C 1 -C 20 烷基; R 7 , R 8 , R 9 , R 10 和R 11 例如彼此独立是氢. C 1 -C 20 烷基, 卤素, CN或NO 2 ; Ar 1 例如是不取代或取代的C 6 -C 20 芳基, C 3 -C 20 杂芳基, C 6 -C 20 芳酰基, C 3 -C 20 杂芳基甲酰基或 或Ar 1 是 Ar 2 例如是苯基, 所有这些都不取代或取代 M例如是不取代或取代的C 1 -C 20 亚烷基 Y是直接键, O, S, NR 5 或CO; Z 1 例如是O或S; Z 2 是直接键, O, S或NR 5 ; 和 Q是CO或直接键。
  • [EN] OXIME ESTER PHOTOINITIATORS<br/>[FR] PHOTOAMORCEURS À BASE D'ESTER D'OXIME
    申请人:BASF SE
    公开号:WO2015036910A1
    公开(公告)日:2015-03-19
    Disclosed are oxime ester compounds which have specific benzo (unsaturated 5-membered ring)-carbonyl group and their use as photoinitiators in photopolymerizable compositions, in particular in photoresist formulations for display applications, e.g. liquid crystal display (LCD), organic light emitting diode (OLED) and touch panel.
    披露的是具有特定苯并(不饱和五元环)-羰基基团的肟酯化合物及其作为光聚合组合物中的光引发剂的使用,特别是在显示应用的抗蚀剂配方中,例如液晶显示(LCD)、有机发光二极管(OLED)和触摸面板。
  • [EN] POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT<br/>[FR] COMPOSITION POLYMÉRISABLE COMPRENANT UN SULFONATE D'OXIME EN TANT QU'AGENT DE DURCISSEMENT THERMIQUE
    申请人:BASF SE
    公开号:WO2012101245A1
    公开(公告)日:2012-08-02
    The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula (I) QAaBbCc where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a + b + c is 1, 2, 3, 4 or 6 where (A) is a group (B) is a group (C) is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.
    本发明涉及一种可聚合的组成,包括至少一种乙炔基不饱和的可聚合化合物和至少一种具有公式(I)QAaBbCc的亚硝基亚磺酸酯化合物,其中a为0、1、2、3、4或6,b为0、1、2、3、4或6,c为0、1、2、3、4或6,其中a+b+c的总和为1、2、3、4或6,其中(A)是一个基团,(B)是一个基团,(C)是一个基团,其中#表示与Q连接的点;X是S或NR14,Q、R1、R2、R3和R14如权利要求1和说明书中所定义。本发明还涉及使用这种组成物,新型亚硝基亚磺酸酯及其作为热固化促进剂的应用。
  • NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20190169211A1
    公开(公告)日:2019-06-06
    The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).
    本发明是基于本文中的情况而作出的。本发明的目的是提供:一种四羧酸二酐,可导致聚酰亚胺,作为感光树脂组合物的基树脂,能够形成细微图案并获得高分辨率,同时不损害优异的特性,如机械强度和粘附性;通过使用该四羧酸二酐获得的聚酰亚胺树脂;以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式(1)所示。
  • [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
    申请人:BASF SE
    公开号:WO2016124493A1
    公开(公告)日:2016-08-11
    Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
    化合物的化学式(I)和(IA),其中X为-O(CO)-;R1为C1-C12卤代烷基或C6-C10卤代芳基;R2位于香豆素环的第7位,为OR8;R2a、R2b和R2C彼此独立地为氢;R3为C1-C8卤代烷基或C1-C8卤代烷基;R4为氢;R8为C1-C6烷基,适用于作为感光酸给体,用于制备光刻胶组合物,例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器(LCD)的制备。
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