2-(2-phenoxyethoxy)ethyl acetate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 2-(2-phenoxyethoxy)ethyl acetate
• 化学式: C₁₂H₁₆O₄
• 分子量: 224.257
• InChiKey: FMRPQUDARIAGBM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  16
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-(2-phenoxyethoxy)ethyl acetate 在 aluminum (III) chloride 、 溴 、 溶剂黄146 作用下， 以 氯苯 为溶剂， 反应 1.5h， 生成 2-[2-[4-(2-Bromo-2-methylpropanoyl)phenoxy]ethoxy]ethyl acetate
  参考文献：
  名称：

  α-卤代苯乙酮化合物的制造方法及α-溴代苯 乙酮化合物

  摘要：

  本发明提供一种α‑卤代苯乙酮化合物的制造方法及α‑溴代苯乙酮化合物。所述α‑卤代苯乙酮化合物的制造方法包含如下步骤：在溶剂中，于路易斯酸的存在下使特定的α‑卤代羧酸卤化物与特定的苯基化合物进行反应，以路易斯酸和特定的苯基化合物成为下述摩尔比的方式进行反应，2≤路易斯酸/苯基化合物≤6。

  公开号：

  CN105593200B
• 作为产物：
  描述：

  2-(2-苯氧基乙氧基)乙醇 、 乙酸酐 反应 6.0h， 以98%的产率得到2-(2-phenoxyethoxy)ethyl acetate
  参考文献：
  名称：

  Active energy ray-curable composition and antistatic film

  摘要：

  提供了一种具有良好抗静电性能、耐刮擦性和透明性的活性能量光固化组合物，以及使用该组合物的抗静电膜。本发明的活性能量光固化组合物是一种活性能量光固化组合物，包括由以下化学式（I）表示的光聚合引发剂A，抗静电聚合物B和含有乙烯基不饱和基团的可聚合化合物C，在化学式（I）中，V1、V2、V3和V4分别独立地表示氢原子或取代基，n表示1到5的整数。

  公开号：

  US10570240B2

文献信息

• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174365A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

  一种抗蚀组合物，含有基础材料组分，其在显影溶液中的溶解性由酸的作用和由化合物代表的公式（bd1）改变；在公式中，Rbd1到Rbd3各自独立地代表可能具有取代基的芳基，前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基，而这些芳基中至少有一个可能具有取代基的氟代烷基与公式中与硫原子相结合的碳原子相邻的碳原子结合，可能具有取代基的氟代烷基的总数为2或更多；X−代表一个对离子。
• METHOD FOR MANUFACTURING a-BROMOACETOPHENONE COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20170029356A1

  公开（公告）日：2017-02-02

  A method for manufacturing an α-bromoacetophenone compound includes brominating a specific phenyl compound by reacting the specific phenyl compound with bromine in a solvent including at least one organic acid ester compound so as to obtain the α-bromoacetophenone compound that is a liquid at 5° C. to 30° C.

  制造α-溴代苯乙酮化合物的方法包括通过将特定苯基化合物与溴在至少含有一种有机酸酯化合物的溶剂中反应溴化特定苯基化合物，以获得在5°C至30°C为液体的α-溴代苯乙酮化合物。
• METHOD FOR PRODUCING ALPHA-HALOGENOACETOPHENON COMPOUND, AND ALPHA-BROMOACETOPHENON COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160200654A1

  公开（公告）日：2016-07-14

  A method for producing an α-halogenoacetophenon compound includes reacting a specific α-halogenocarboxylic halide compound and a specific phenyl compound in the presence of a Lewis acid in a solvent, in which the α-halogenoacetophenon compound and the phenyl compound are reacted with each other in a molar ratio of the Lewis acid to the phenyl compound represented below. 2≦Lewis acid/phenyl compound≦6

  生产α-卤代乙酰苯酮化合物的方法包括在溶剂中，在Lewis酸的存在下，反应特定的α-卤代羧酸卤化物化合物和特定的苯化合物，其中α-卤代乙酰苯酮化合物和苯化合物按照以下所示的Lewis酸与苯化合物的摩尔比进行反应。2≦Lewis酸/苯化合物≦6