3-isopropyl-hexan-2-one | 40239-28-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-isopropyl-hexan-2-one
• 英文别名: 3-Isopropyl-hexan-2-on；3-(1-Methylethyl)-2-hexanone；3-propan-2-ylhexan-2-one
• CAS: 40239-28-9
• 化学式: C₉H₁₈O
• 分子量: 142.241
• InChiKey: KUAQNTZQANBMID-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-甲基-2-己烯 、 乙酰氯 在 四氯化锡 作用下， 生成 3-isopropyl-hexan-2-one
  参考文献：
  名称：

  Colonge; Mostafavi, Bulletin de la Societe Chimique de France, 1939, vol. <5>6, p. 344

  摘要：

  DOI：

文献信息

• TRIAZOLYL DERIVATIVES AS SYK INHIBITORS
  申请人：MACHACEK Michelle R.

  公开号：US20150239866A1

  公开（公告）日：2015-08-27

  Provided are triazole derivatives of Formula I which are potent inhibitors of spleen tyrosine kinase and pharmaceutical composition. The triazole derivatives are useful in the treatment and prevention of diseases mediated by said enzyme, such as asthma, COPD, rheumatoid arthritis, and cancer.

  提供了公式I的三唑衍生物，它们是脾酪氨酸激酶的强效抑制剂和药物组合物。这些三唑衍生物可用于治疗和预防由该酶介导的疾病，如哮喘、COPD、类风湿性关节炎和癌症。
• Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
  申请人：Samsung Electronics Co., Ltd.

  公开号：US10685844B2

  公开（公告）日：2020-06-16

  Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.

  本文提供了一种硬掩膜组合物、一种使用硬掩膜组合物形成图案的方法，以及一种使用硬掩膜组合物形成的硬掩膜。硬掩膜组合物包括极性非水有机溶剂和以下物质之一：i) 石墨烯量子点和至少一种选自二烯烃和亲二烯烃的混合物；ii) 石墨烯量子点和至少一种选自二烯烃和亲二烯烃的 Diels-Alder 反应产物；iii) 石墨烯量子点和至少一种选自二烯烃和亲二烯烃的 Diels-Alder 反应产物的热处理产物；或 iv) 它们的组合。
• HARDMASK COMPOSITION, METHOD OF FORMING PATTERN BY USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED USING THE HARDMASK COMPOSITION
  申请人：Samsung Electronics Co., Ltd.

  公开号：US20190035635A1

  公开（公告）日：2019-01-31

  Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
• US9586931B2
  申请人：——

  公开号：US9586931B2

  公开（公告）日：2017-03-07
• Colonge; Mostafavi, Bulletin de la Societe Chimique de France, 1939, vol. <5>6, p. 344
  作者：Colonge、Mostafavi

  DOI：——

  日期：——