申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20130260312A1
公开(公告)日:2013-10-03
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including a base component that exhibits changed solubility in a developing solution under the action of acid, the base component containing a resin component having a structural unit represented by general formula (a0-1) shown below:
in which R
1
represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, R
2
represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and X represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.
一种抗蚀组合物,暴露后产生酸并在酸的作用下在显影溶液中表现出改变的溶解度,该抗蚀组合物包括一种在酸的作用下在显影溶液中表现出改变的溶解度的碱性组分,该碱性组分包含具有下式(a0-1)所表示的结构单元的树脂组分:其中R1表示氢原子或1至5个碳原子的烷基;R2表示氢原子、1至5个碳原子的烷基或1至5个碳原子的卤代烷基;X表示氧原子、硫原子或1至5个碳原子的含氧原子或硫原子的亚烷基。