申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20170131635A1
公开(公告)日:2017-05-11
A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R
1
-R
6
are monovalent hydrocarbon groups, X
1
is a divalent hydrocarbon group, Z
1
is an aliphatic group, Z
2
forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
提供了一个化学式为(1a)或(1b)的单体,其中A是一个可聚合的基团,R1-R6是一价碳氢基团,X1是一个二价碳氢基团,Z1是一个脂肪基团,Z2形成一个脂环基团,k=0或1,m=1或2,n=1到4。通过聚合单体得到了一种有用的聚合物。包含该聚合物的抗蚀组合物具有改善的显影性能,并且经过处理形成具有高对比度、高分辨率和耐蚀性的负图案,该负图案在碱性显影剂中不溶。