To provide a resist composition for negative tone development, which can form a pattern having a good profile improved in the pattern undercut and moreover, can reduce the line edge roughness and enhance the in-plane uniformity of the pattern dimension, and a pattern forming method using the same.
A resist composition for negative tone development, comprising (A) a resin capable of increasing the polarity by the action of an acid to increase the solubility in a positive tone developer and decrease the solubility in a negative tone developer, (B) a compound capable of generating an acid having an acid dissociation index pKa of -4.0 or less upon irradiation with an actinic ray or radiation, and (C) a solvent; and a pattern forming method using the same.
提供一种用于负阶调显影的抗蚀剂组合物,该组合物可形成在图案下切处具有良好轮廓改善的图案,此外,还可降低线边粗糙度并提高图案尺寸的平面内均匀性,以及使用该组合物的图案形成方法。
一种用于负阶调显影的抗蚀剂组合物,包括(A)在酸的作用下能够增加极性以提高在正阶调显影剂中的溶解度并降低在负阶调显影剂中的溶解度的
树脂,(B)在用辐照射线或辐射照射时能够生成酸解离指数 pKa 为 -4.0 或以下的酸的化合物,以及(C)溶剂;以及使用该组合物的图案形成方法。