Ethylketen-diethylacetal | 142721-95-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Ethylketen-diethylacetal
• 英文别名: Aethylketen-diaethylacetal；1,1-Diethoxybut-1-ene
• CAS: 142721-95-7
• 化学式: C₈H₁₆O₂
• 分子量: 144.214
• InChiKey: VXGAQZQBZAFNKH-UHFFFAOYSA-N

物化性质

• 沸点：
  158.3±13.0 °C(Predicted)
• 密度：
  0.864±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Ethylketen-diethylacetal 、 1,1-二乙氧基乙烯 在 臭氧 作用下， 生成 3,3-Diethoxy-5-ethyl-1,2-dioxolan
  参考文献：
  名称：

  Reiser, Ralf; Sueling, Carsten; Schroeder, Gerhard, Chemische Berichte, 1992, vol. 125, # 11, p. 2493 - 2502

  摘要：

  DOI：
• 作为产物：
  描述：

  2-Bromorthobuttersaeure-triethylester 在 氢化钾 作用下， 以 苯 为溶剂， 以45%的产率得到Ethylketen-diethylacetal
  参考文献：
  名称：

  Reiser, Ralf; Sueling, Carsten; Schroeder, Gerhard, Chemische Berichte, 1992, vol. 125, # 11, p. 2493 - 2502

  摘要：

  DOI：

文献信息

• Acrylic or methacrylic acid derivatives and polymers obtained therefrom
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD

  公开号：EP0875496A1

  公开（公告）日：1998-11-04

  A monomer of the formula: wherein R5, R6 and R7 are independently hydrogen, alkyl, cyano, alkyloxycarbonyl or carbamoyl; Z is a spacer or a direct link; and R is hydroxyalkyl having a protected terminal hydroxy, can produce a polymer useful for producting a resist composition.

  式中的单体： 其中 R5、R6 和 R7 分别独立地为氢、烷基、氰基、烷氧羰基或氨基甲酰基；Z 为间隔物或直接连接；R 为具有保护端羟基的羟烷基。
• Resist composition and its use for forming pattern
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD

  公开号：EP0875789A1

  公开（公告）日：1998-11-04

  A resist composition comprising (a) a polymer having repeating units of the formula: wherein R5, R6 and R7 are independently hydrogen, alkyl, cyano, alkyloxycarbonyl or carbamoyl; Z is a spacer or a direct link; and R is hydroxyalkyl having a protected terminal hydroxy, (b) a photoacid generator, and (c) a solvent, is effective for forming patterns using ArF excimer laser beams.

  一种抗蚀剂组合物，包括(a)具有式中重复单元的聚合物： 其中 R5、R6 和 R7 独立地是氢、烷基、氰基、烷氧羰基或氨基甲酰基；Z 是间隔物或直接连接；R 是具有保护端羟基的羟烷基；(b) 光酸发生器；(c) 溶剂，可有效地使用 ArF 准分子激光束形成图案。
• A novel monomer and a polymer obtained therefrom
  申请人：Wako Pure Chemical Industies, Ltd.

  公开号：EP0918048A1

  公开（公告）日：1999-05-26

  This invention relates to a monomer shown by the general formula [1] (wherein X' is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

  本发明涉及通式[1]所示的单体 (其中，X'是含有可聚合双键的环状烃残基，该双键可能具有取代基；Z是间隔键或直接键；R是具有一个或两个受保护羟基作为取代基的取代烷基或烯基）和含有从上述单体衍生的段的聚合物。 上述聚合物可用于半导体元件等生产中使用的抗蚀剂组合物等，上述单体可用作聚合物的起始材料，使用上述聚合物的抗蚀剂组合物可非常有利地用作 ArF 准分子激光束的抗蚀剂材料，而 ArF 准分子激光束被认为是下一代有价值的曝光技术。
• Novel monomer and a polymer obtained therefrom
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20020042531A1

  公开（公告）日：2002-04-11

  This invention relates to a monomer shown by the general formula [1] 1 (wherein X′ is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

  本发明涉及一种通式为[1&rsqb的单体； 1 (其中，X′是含有可聚合双键的环状烃残基，该双键可能具有取代基；Z是间隔键或直接键；R是具有一个或两个受保护羟基作为取代基的取代烷基或烯基），以及含有由上述单体衍生的段的聚合物。 上述聚合物可用于半导体元件等生产中使用的抗蚀剂组合物等，上述单体可用作聚合物的起始材料，使用上述聚合物的抗蚀剂组合物可非常有利地用作 ArF 准分子激光束的抗蚀剂材料，而 ArF 准分子激光束被认为是下一代有价值的曝光技术。
• Scarpati,R. et al., Gazzetta Chimica Italiana, 1968, vol. 98, p. 681 - 695
  作者：Scarpati,R. et al.

  DOI：——

  日期：——