作者:Raj K. Chadha、John E. Drake、Mary K.H. Neo
DOI:10.1016/0022-328x(84)80678-6
日期:1984.12
The reactions of several organosilicon hydrides PhnSiH4-n, n = 1, 2; R3SiH, R3 = Ph3, Ph2Me, PhMe2 (n-C6H13)3; (p-Me2HSi)2C6H4, with TeCl4 in benzene resulted in the formation of tellurium metal and chlorosilanes in 75–90% yields. Similar reactions with aryltellurium trichlorides (RTeCl3, R = Ph, p-MeOC6H4, p-EtOC6H4) proceeded in two different ways. On stirring at room temperature for 6–8 h, diaryl
几种有机硅氢化物Ph n SiH 4- n的反应,n = 1,2; R 3 SiH,R 3= Ph 3,Ph 2 Me,PhMe 2(nC 6 H 13)3;(p -Me 2 HSi)2 C 6 H 4和苯中的TeCl 4导致碲金属和氯硅烷的形成,产率为75-90%。与三氯化芳基碲(RTeCl 3,R = Ph,p -MeOC 6 H在图4中,p- EtOC 6 H 4)以两种不同方式进行。在室温下搅拌6–8小时,以70–95%的收率获得二芳基二碲化物和氯硅烷,而在回流6–10小时时,以80–95%的收率获得碲粉和二氯二芳基碲化物。二芳基二氯化碲(R 2 TeCl 2,R = Ph,p -MeOC 6 H 4)不易与PhSiH 3或与Ph 3 SiH反应。