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1-(2',4'-二(缩水甘油醚基)苯基)金刚烷 | 928164-82-3

中文名称
1-(2',4'-二(缩水甘油醚基)苯基)金刚烷
中文别名
——
英文名称
4-(1-adamantyl)-1,3-diglycidyloxybenzene
英文别名
1-(2,4-diglycidyloxyphenyl)adamantane;2-[[2-(1-adamantyl)-5-(oxiran-2-ylmethoxy)phenoxy]methyl]oxirane
1-(2',4'-二(缩水甘油醚基)苯基)金刚烷化学式
CAS
928164-82-3
化学式
C22H28O4
mdl
——
分子量
356.462
InChiKey
OFRGWWQFVLNGRP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.7
  • 重原子数:
    26
  • 可旋转键数:
    7
  • 环数:
    7.0
  • sp3杂化的碳原子比例:
    0.73
  • 拓扑面积:
    43.5
  • 氢给体数:
    0
  • 氢受体数:
    4

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    1-(2',4'-二(缩水甘油醚基)苯基)金刚烷 在 5% rhodium-on-charcoal 氢气 作用下, 以 四氢呋喃 为溶剂, 50.0 ℃ 、4.0 MPa 条件下, 反应 5.0h, 以72%的产率得到4-(1-adamantyl)-1,3-diglycidyloxycyclohexane
    参考文献:
    名称:
    EP1930327
    摘要:
    公开号:
  • 作为产物:
    描述:
    4-(1-adamantyl)resorcinol环氧氯丙烷sodium hydroxide 作用下, 以 二甲基亚砜4-甲基-2-戊酮 为溶剂, 反应 3.0h, 以94%的产率得到1-(2',4'-二(缩水甘油醚基)苯基)金刚烷
    参考文献:
    名称:
    ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC MEMBER AND SEALING AGENT FOR ELECTRONIC CIRCUIT USING THOSE
    摘要:
    本发明涉及一种金刚烷衍生物,其提供了在光学特性(如透明度和耐光性)、长期耐热性、电学特性(如介电常数)和低吸水性等方面表现出色的固化产物。本发明还涉及一种含有金刚烷衍生物的树脂组合物,以及使用该树脂组合物的电子电路密封剂、光电子元件、半导体器件和铜覆盖层层压板,以及一种辐射敏感的树脂组合物,其中包含上述金刚烷衍生物作为交联剂。具体公开了以下公式(I-1)所表示的金刚烷衍生物,以及含有该金刚烷衍生物的树脂组合物、电子电路密封剂、光电子元件、半导体器件和铜覆盖层层压板,以及含有上述金刚烷衍生物作为交联剂的辐射敏感的树脂组合物。
    公开号:
    EP1985616A1
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文献信息

  • ADAMANTYL GROUP-CONTAINING EPOXY-MODIFIED (METH)ACRYLATE AND RESIN COMPOSITION CONTAINING THE SAME
    申请人:Okada Yasunari
    公开号:US20090099330A1
    公开(公告)日:2009-04-16
    The present invention provides an adamantyl group containing epoxy-modified (meth)acrylate and a resin composition containing it which are imparted by transparency, optical characteristics such as (durable) light resistance and the like, heat-resistance, and good mechanical properties. For example, they are an adamantyl group containing epoxy-modified (meth)acrylate having the following general formula (I) and a composition containing it. In the formula, R 1 represents a hydrogen atom or a methyl group, and R 2 represents a halogen atom or an aliphatic hydrocarbon group which may contain a hetero atom. Plural R 2 may be the same or different, and m represents an integer of 0 to 4 and n represents an integer of 0 or more.
    本发明提供了一种含有金刚烷基的环氧改性(甲基)丙烯酸酯及其树脂组合物,具有透明度、光学特性(耐久性)和热稳定性等优良机械性能。例如,它们是具有以下一般式(I)的含有金刚烷基的环氧改性(甲基)丙烯酸酯及其组合物。在该式中,R1代表氢原子或甲基基团,R2代表卤素原子或可能包含杂原子的脂肪烃基团。复数的R2可能相同或不同,m表示0到4的整数,n表示0或更多的整数。
  • Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
    申请人:Idemitsu Kosan Co., Ltd.
    公开号:US08084650B2
    公开(公告)日:2011-12-27
    Disclosed is an adamantane derivative which provides a cured product excellent in optical characteristics such as transparency and light resistance, long-term heat resistance, electrical characteristics such as and dielectric constant, and low water absorption. Also disclosed are a resin composition containing the adamantane derivative, a sealing agent for electronic circuits, optical electronic member, semiconductor device and copper-clad laminate all using the resin composition, and a radiation-sensitive resin composition which contains the above-mentioned adamantane derivative as a crosslinking agent. Specifically disclosed are an adamantane derivative represented by the formula (I-1) below, a resin composition containing the adamantane derivative, a sealing agent for electronic circuits, optical electronic member, semiconductor device and copper-clad laminate, all using the resin composition, and a radiation-sensitive resin composition which contains the above-mentioned adamantane derivative as a crosslinking agent.
    本发明涉及一种金刚烷衍生物,其提供了优良的光学特性,例如透明度和耐光性、长期耐热性、电学特性,例如介电常数和低吸水性的固化产品。同时,本发明还涉及一种含有金刚烷衍生物的树脂组合物,一种用于电路封装的密封剂、光电器件、半导体器件和使用树脂组合物的铜覆盖层层压板,以及一种辐射敏感的树脂组合物,其中包含上述金刚烷衍生物作为交联剂。具体揭示了以下公式(I-1)所代表的金刚烷衍生物、含有金刚烷衍生物的树脂组合物、用于电路封装的密封剂、光电器件、半导体器件和铜覆盖层层压板,均使用上述树脂组合物,以及一种含有上述金刚烷衍生物作为交联剂的辐射敏感的树脂组合物。
  • Adamantyl group-containing epoxy-modified (meth)acrylate and resin composition containing the same
    申请人:Idemitsu Kosan Co., Ltd.
    公开号:US07790917B2
    公开(公告)日:2010-09-07
    The present invention provides an adamantyl group containing epoxy-modified (meth)acrylate and a resin composition containing it which are imparted by transparency, optical characteristics such as (durable) light resistance and the like, heat-resistance, and good mechanical properties. For example, they are an adamantyl group containing epoxy-modified (meth)acrylate having the following general formula (I) and a composition containing it. In the formula, R1 represents a hydrogen atom or a methyl group, and R2 represents a halogen atom or an aliphatic hydrocarbon group which may contain a hetero atom. Plural R2 may be the same or different, and m represents an integer of 0 to 4 and n represents an integer of 0 or more.
    本发明提供了一种含有金刚烷基的环氧改性(甲基)丙烯酸酯以及含有该酯的树脂组合物,这些组合物具有透明度、耐光性等光学特性、耐热性和良好的机械性能。例如,它们是具有以下通式(I)的含有金刚烷基的环氧改性(甲基)丙烯酸酯和含有它的组合物。在该式中,R1代表氢原子或甲基基团,R2代表卤素原子或可能含有杂原子的脂肪烃基团。多个R2可能相同或不同,m表示0到4的整数,n表示0或更多的整数。
  • FILTRATION FILTER, FILTRATION METHOD, PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:EP3159057A2
    公开(公告)日:2017-04-26
    A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.
    一种用于过滤光刻用液体化学品的过滤过滤器,配有聚酰亚胺树脂多孔膜;一种过滤方法,包括允许光刻用液体化学品通过过滤过滤器;以及一种光刻用纯化液体化学品的生产方法,包括通过过滤方法过滤光刻用液体化学品。
  • Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US10429738B2
    公开(公告)日:2019-10-01
    A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.
    一种用于过滤光刻用液体化学品的过滤过滤器,配有聚酰亚胺树脂多孔膜;一种过滤方法,包括允许光刻用液体化学品通过过滤过滤器;以及一种光刻用纯化液体化学品的生产方法,包括通过过滤方法过滤光刻用液体化学品。
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