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1-(甲氧基甲氧基)壬烷 | 79137-09-0

中文名称
1-(甲氧基甲氧基)壬烷
中文别名
——
英文名称
1-(Methoxymethoxy)nonane
英文别名
——
1-(甲氧基甲氧基)壬烷化学式
CAS
79137-09-0
化学式
C11H24O2
mdl
——
分子量
188.31
InChiKey
VYELHNKAYFGZRX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4
  • 重原子数:
    13
  • 可旋转键数:
    10
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

SDS

SDS:529242ab2699da8e8ac3b5db42bb9407
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反应信息

  • 作为反应物:
    描述:
    1-(甲氧基甲氧基)壬烷 在 magnesium bromide 作用下, 以 乙醚 为溶剂, 反应 36.0h, 以93%的产率得到1-壬醇
    参考文献:
    名称:
    Conversion of acetals into monothioacetals, α-alkoxyazides and α-alkoxyalkyl thioacetates with magnesium bromide
    摘要:
    DOI:
    10.1016/s0040-4039(00)70654-x
  • 作为产物:
    描述:
    二甲醇缩甲醛1-壬醇 在 Nafion-H 作用下, 反应 10.0h, 以93%的产率得到1-(甲氧基甲氧基)壬烷
    参考文献:
    名称:
    Catalysis by Solid Superacids1; 15. Facile Preparation of Methoxymethyl Ethers
    摘要:
    DOI:
    10.1055/s-1981-29491
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文献信息

  • Iodotrimethylsilane-Catalyzed Preparation of Methoxymethyl Ethers of Primary and Secondary Alcohols with Dimethoxymethane
    作者:George A. Olah、Altaf Husain、Subhash C. Narang
    DOI:10.1055/s-1983-30554
    日期:——
  • OLAH, G. A.;HUSAIN, A.;NARANG, S. C., SYNTHESIS, BRD, 1983, N 11, 896-897
    作者:OLAH, G. A.、HUSAIN, A.、NARANG, S. C.
    DOI:——
    日期:——
  • METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20150221500A1
    公开(公告)日:2015-08-06
    The present invention provides a method for cleaning and drying a semiconductor substrate in which a semiconductor substrate onto which a pattern has been formed is cleaned and dried, which comprises steps of (1) cleaning the semiconductor substrate onto which a pattern has been formed with a cleaning solution, (2) substituting the cleaning solution with a composition solution containing a resin (A) which is decomposed by either or both of an acid and heat, and (3) decomposing and removing the resin (A) by either or both of an acid and heat. There can be provided a method for cleaning and drying a semiconductor substrate in which pattern falling or collapse occurring at the time of drying the cleaning solution after cleaning the substrate can be suppressed, and the cleaning solution can be efficiently removed, without using a specific apparatus which handles a supercritical state cleaning solution.
  • US9524863B2
    申请人:——
    公开号:US9524863B2
    公开(公告)日:2016-12-20
  • Catalysis by Solid Superacids<sup>1</sup>; 15. Facile Preparation of Methoxymethyl Ethers
    作者:George A. Olah、Altaf Husain、B. G. Balaram Gupta、Subhash C. Narang
    DOI:10.1055/s-1981-29491
    日期:——
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