1,1,1,3,3,3-hexafluoro-2-(2-fluoro-bicyclo[2.2.1]hept-5-en-2-yl)-propan-2-ol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,1,1,3,3,3-hexafluoro-2-(2-fluoro-bicyclo[2.2.1]hept-5-en-2-yl)-propan-2-ol
• 英文别名: (2-fluoro-5-norbornene-2-yl)-1,1,1,3,3,3-hexafluoro-2-propanol；1,1,1,3,3,3-hexafluoro-2-(2-fluoro-2-bicyclo[2.2.1]hept-5-enyl)propan-2-ol
• 化学式: C₁₀H₉F₇O
• 分子量: 278.17
• InChiKey: GCGWKUMJDMMUIE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  1,1,1,3,3,3-hexafluoro-2-(2-fluoro-bicyclo[2.2.1]hept-5-en-2-yl)-propan-2-ol 、 氯甲基乙醚 在 sodium hydride 作用下， 以 四氢呋喃 为溶剂， 反应 8.5h， 以77%的产率得到2-(Ethoxymethoxy)-2-(2-fluorobicyclo[2.2.1]hepta-5-ene-2-yl)-1,1,1,3,3,3-hexafluoropropane
  参考文献：
  名称：

  PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES

  摘要：

  公开号：

  EP1415974B1
• 作为产物：
  描述：

  2-氟双环[2.2.1]庚-5-烯-2-羰基氟化物 、 (三氟甲基)三甲基硅烷 在 potassium fluoride 作用下， 反应 2.0h， 以80%的产率得到1,1,1,3,3,3-hexafluoro-2-(2-fluoro-bicyclo[2.2.1]hept-5-en-2-yl)-propan-2-ol
  参考文献：
  名称：

  PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES

  摘要：

  公开号：

  EP1415974B1

文献信息

• Process for preparing fluorine-containing norbornene derivative
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：US20040214103A1

  公开（公告）日：2004-10-28

  There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F 2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

  提供了一种新型的诺博烯衍生物，可用作F2激光化学扩增型光刻胶的材料，具有优异的透明性和改善的干法蚀刻抗性，并且具有直接连接到诺博烯骨架的含氟酮基或含氟三级醇基；通过使用该诺博烯衍生物作为共聚单体获得的含氟聚合物；以及包括含氟聚合物、光酸发生剂和溶剂的化学扩增型光刻胶组合物。
• POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1398339A1

  公开（公告）日：2004-03-17

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B) .

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有酸可分解基团的树脂、 其中，R1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂肪族基团，R2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物（A）包括聚硅氧烷（A）和光酸发生器（B）。
• Positive photoresist composition and pattern making method using the same
  申请人：Fuji Photo Film Co., Ltd.

  公开号：EP1508838A2

  公开（公告）日：2005-02-23

  Apositive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.

  阳性光刻胶组合物，含有(A) 一种树脂，它至少含有一种由本文定义的式 (IA) 所代表的重复单元和一种由本文定义的式 (IB) 所代表的重复单元，该树脂在酸的作用下分解，并在碱显影剂中的溶解度增加；以及 (B) 至少两种选自本文定义的化合物 (B1)、(B2)、(B3) 和 (B4) 的化合物，这些化合物在用辐照射线和辐射照射时能产生酸。
• Polysiloxane, process for production thereof and radiation-sensitive resin composition
  申请人：——

  公开号：US20040143082A1

  公开（公告）日：2004-07-22

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, 1 wherein R 1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R 2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有可酸解基团的树脂、 1 其中 R 1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂 族基团，R 2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物 (A) 包括聚硅氧烷 (A) 和光酸发生器 (B)
• Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
  作者：Takuji Ishikawa、Tesuhiro Kodani、Tomohiro Yoshida、Tsukasa Moriya、Tsuneo Yamashita、Minoru Toriumi、Takayuki Araki、Hirokazu Aoyama、Takuya Hagiwara、Takamitsu Furukawa、Toshiro Itani、Kiyoshi Fujii

  DOI：10.1016/j.jfluchem.2004.09.012

  日期：2004.11

  We have synthesized various main-chain fluorinated polymers and studied base-resin properties, such as transparency at 157 nm, solubility in a standard alkaline developer, and lithographic performance. Main-chain-fluorinated polymers were synthesized by copolymerization of tetrafluoroethylene (TFE) with cyclic monomers, especially newly synthesized norbornene derivatives. We studied the correlation between pK(a)(OH) and the solubility of the copolymers of TFE and functional (fluoroalkyl alcohol group) norbornenes. Their solubility depends on the pK(a) value of the fluoroalkyl alcohol groups.We studied the impact of the polymerization initiators on base-resin properties. High transparency was obtained by using the fluorocarbon initiator. It was also confirmed that the monocyclic component improves dry-etch resistance and that fluorination at the terminal groups improves alkaline solubility.In addition, we found that the development characteristics of TFE/norbornene copolymers were significantly improved by the stereoselective (endo, versus exo) partial protection of the hydroxyl groups in the fluoroalkyl alcohol moiety attached to norbornere unit. The polymer protected only in the exo position of the norbornene unit in the copolymer had a higher R a, and a higher contrast. Positive-working resists based on these fluoropolymers were developed and 55 nm dense lines could be delineated by exposure at 157 nm wavelength with an alternating phase shift mask on a 0.9 NA 157 nm exposure tool. (C) 2004 Elsevier B.V. All rights reserved.