Salt suitable for an acid generator and a chemically amplified resist composition containing the same
申请人:Harada Yukako
公开号:US20070078269A1
公开(公告)日:2007-04-05
The present invention provides a salt of the formula (I):
wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH
2
— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q
1
and Q
2
each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A
+
represents organic counter ion; and n shows an integer of 0 to 12.
The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:ICHIKAWA Koji
公开号:US20100304293A1
公开(公告)日:2010-12-02
A salt represented by the formula (a):
wherein Q
1
and Q
2
each independently represent a fluorine atom etc.,
X
1
represents a single bond etc.,
X
2
represents a single bond etc.,
Y
1
represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X
2
—Y
1
group has one or more fluorine atoms, and
Z
+
represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150322027A1
公开(公告)日:2015-11-12
A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
Tocopherol-modified therapeutic drug compounds; emulsion, microemulsion, and micelle formulations that include the compounds; methods for making the compounds and formulations; methods for administering the compounds and formulations; and methods for treating conditions using the compounds and formulations.
Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
申请人:Shigematsu Junji
公开号:US20080086014A1
公开(公告)日:2008-04-10
The present invention provides a salt represented by the formula (I):
wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH
2
— in the C3-C30 divalent group may be substituted with —O— or —CO—,
Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH
2
— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—,
Q
1
and Q
2
each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A
+
represents an organic counter ion.