2-(trimethylsilylmethyl)acrylic acid | 75366-35-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-(trimethylsilylmethyl)acrylic acid
• 英文别名: 2-(trimethylsilylmethyl)prop-2-enoic acid
• CAS: 75366-35-7
• 化学式: C₇H₁₄O₂Si
• 分子量: 158.272
• InChiKey: DRWLHQZIZRHTHX-UHFFFAOYSA-N

物化性质

• 沸点：
  222.8±23.0 °C(Predicted)
• 密度：
  0.934±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.97
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-(trimethylsilylmethyl)acrylic acid 在 dichloro(pentamethylcyclopentadienyl)rhodium (III) dimer 、 sodium acetate 、 三乙胺 作用下， 以 四氢呋喃 、 1,2-二氯乙烷 为溶剂， 反应 16.0h， 生成 (E)-N-tosyl-5-(triisopropylsilyl)-2-((trimethylsilyl)methyl)pent-2-en-4-ynamide
  参考文献：
  名称：

  Rhodium(III)-Catalyzed Olefinic C–H Alkynylation of Acrylamides Using Tosyl-Imide as Directing Group

  摘要：

  The Rh(III)-catalyzed CH alkynylation of acrylamide derivative is realized using a hypervalent alkynyl iodine reagent. The use of a weakly coordinating directing group proved to be of critical importance. This reaction displays broad functional group tolerance and high efficiency, which opens a new synthetic pathway to access functionalized 1,3-enyne skeletons.

  DOI：

  10.1021/ol502984g
• 作为产物：
  描述：

  3-trimethylsilyl-2-diethylphosphonopropionic acid ethyl ester 在 potassium carbonate 、 lithium hydroxide 作用下， 以 四氢呋喃 、 水 为溶剂， 反应 2.0h， 生成 2-(trimethylsilylmethyl)acrylic acid
  参考文献：
  名称：

  Rhodium(III)-Catalyzed Olefinic C–H Alkynylation of Acrylamides Using Tosyl-Imide as Directing Group

  摘要：

  The Rh(III)-catalyzed CH alkynylation of acrylamide derivative is realized using a hypervalent alkynyl iodine reagent. The use of a weakly coordinating directing group proved to be of critical importance. This reaction displays broad functional group tolerance and high efficiency, which opens a new synthetic pathway to access functionalized 1,3-enyne skeletons.

  DOI：

  10.1021/ol502984g

文献信息

• Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US07192684B2

  公开（公告）日：2007-03-20

  Polymerizable silicon-containing compounds of formula (1) wherein R1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs

  具有以下化学式（1）的可聚合硅含有化合物，在其中R1是氢、卤素或一价有机基团，可聚合成聚合物。以该聚合物为基础树脂的抗蚀组合物对高能辐射敏感，在波长小于300纳米时具有优异的敏感性和分辨率，并具有高抗氧等离子体刻蚀性能，因此适用于微细图案化制造VLSI。
• 2-Alkoxycarbonylallyltrimethylsilanes as new reagents of 2-alkoxycarbonylallylation of electrophiles
  作者：Akira Hosomi、Hidehiko Hashimoto、Hideki Sakurai

  DOI：10.1016/s0040-4039(00)77748-3

  日期：1980.1
• HOSOMI AKIRA; HASHIMOTO HIDEHIKO; SAKURAI HIDEKI, TETRAHEDRON LETT., 1980, 21, NO 10, 951-954
  作者：HOSOMI AKIRA、 HASHIMOTO HIDEHIKO、 SAKURAI HIDEKI

  DOI：——

  日期：——
• Rhodium(III)-Catalyzed Olefinic C–H Alkynylation of Acrylamides Using Tosyl-Imide as Directing Group
  作者：Chao Feng、Daming Feng、Yang Luo、Teck-Peng Loh

  DOI：10.1021/ol502984g

  日期：2014.11.21

  The Rh(III)-catalyzed CH alkynylation of acrylamide derivative is realized using a hypervalent alkynyl iodine reagent. The use of a weakly coordinating directing group proved to be of critical importance. This reaction displays broad functional group tolerance and high efficiency, which opens a new synthetic pathway to access functionalized 1,3-enyne skeletons.