1-bromo-2-tert-butoxy-4-fluorobenzene | 960309-88-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-bromo-2-tert-butoxy-4-fluorobenzene
• 英文别名: 1-Bromo-2-(1,1-dimethylethoxy)-4-fluorobenzene；1-bromo-4-fluoro-2-[(2-methylpropan-2-yl)oxy]benzene
• CAS: 960309-88-0
• 化学式: C₁₀H₁₂BrFO
• 分子量: 247.107
• InChiKey: YSYOBWIBVCCPFG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-bromo-2-tert-butoxy-4-fluorobenzene 在 palladium diacetate 、 tricyclohexylphosphine tetrafluoroborate caesium carbonate 、 三甲基乙酸 作用下， 以 均三甲苯 为溶剂， 反应 12.0h， 以68%的产率得到6-fluoro-2,3-dihydro-2,2-dimethylbenzofuran
  参考文献：
  名称：

  High-Yielding Palladium-Catalyzed Intramolecular Alkane Arylation:  Reaction Development and Mechanistic Studies

  摘要：

  Palladium-catalyzed alkane arylation reactions with aryl halides are described for the preparation of 2,2-dialkyl-dihydrobenzofuran substrates. These reactions occur in excellent yield and very high selectivity for the formation of one sole product arising from a reaction at nearby methyl groups. Mechanistic and computational studies point to the involvement of a concerted, inner-sphere palladation-deprotonation pathway that is enabled by the presence of three-center agostic interactions at the transition state. This mechanism accurately predicts the experimentally observed kinetic isotope effect as well as the site selectivity and should be useful in the design of new reactions and catalysts.

  DOI：

  10.1021/ja076588s
• 作为产物：
  描述：

  异丁烯 、 2-溴-5-氟苯酚 在 三氟甲磺酸 作用下， 以 二氯甲烷 为溶剂， 反应 4.0h， 以93%的产率得到1-bromo-2-tert-butoxy-4-fluorobenzene
  参考文献：
  名称：

  High-Yielding Palladium-Catalyzed Intramolecular Alkane Arylation:  Reaction Development and Mechanistic Studies

  摘要：

  Palladium-catalyzed alkane arylation reactions with aryl halides are described for the preparation of 2,2-dialkyl-dihydrobenzofuran substrates. These reactions occur in excellent yield and very high selectivity for the formation of one sole product arising from a reaction at nearby methyl groups. Mechanistic and computational studies point to the involvement of a concerted, inner-sphere palladation-deprotonation pathway that is enabled by the presence of three-center agostic interactions at the transition state. This mechanism accurately predicts the experimentally observed kinetic isotope effect as well as the site selectivity and should be useful in the design of new reactions and catalysts.

  DOI：

  10.1021/ja076588s

文献信息

• Regioselective SNAr reactions of substituted difluorobenzene derivatives: practical synthesis of fluoroaryl ethers and substituted resorcinols
  作者：Stéphane G. Ouellet、Anna Bernardi、Remy Angelaud、Paul D. O’Shea

  DOI：10.1016/j.tetlet.2009.03.204

  日期：2009.7

  In this Letter, we describe a practical and highly selective method for the preparation of fluoroaryl ethers and differentially substituted resorcinol derivatives. This synthetic strategy relies on a selective SNAr of substituted difluorobenzene derivatives with various alcohols.

  在这封信中，我们描述了一种实用且高度选择性的方法，用于制备氟代芳基醚和差异取代的间苯二酚衍生物。该合成策略依赖于取代的二氟苯衍生物与各种醇的选择性S N Ar。
• SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180099928A1

  公开（公告）日：2018-04-12

  A sulfonium compound having formula (1) is provided wherein R 1 , R 2 and R 3 are a C 1 -C 20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved LWR and pattern collapse.

  提供了一个具有式（1）的磺鎓化合物，其中R1，R2和R3是C1-C20单价含有杂原子的碳氢基团，p = 0-5，q = 0-5，r = 0-4。利用光刻技术处理含有该磺鎓化合物的抗蚀剂组合物，可形成具有改善的LWR和图案崩溃的抗蚀剂图案。
• Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180180992A1

  公开（公告）日：2018-06-28

  A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of formula (A) has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

  一种正性光刻胶组合物，包括一种聚合物，该聚合物适于在酸的作用下分解，以增加其在碱性显影剂中的溶解度，以及一种化学式（A）的磺化物化合物，具有高分辨率。当使用光刻技术处理光刻胶组合物时，可以形成最小LER的图案。
• CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180180998A1

  公开（公告）日：2018-06-28

  A negative resist composition comprising a sulfonium compound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.

  提供一种负型光刻胶组合物，包括具有公式(A)的磺化物化合物和基础聚合物。该光刻胶组合物在图案形成期间表现出高分辨率，并形成具有最小LER的图案。
• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3343291A1

  公开（公告）日：2018-07-04

  A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of formula (A) has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

  一种由聚合物和式（A）的锍化合物组成的正抗蚀剂组合物具有很高的分辨率，聚合物可在酸的作用下分解以增加其在碱性显影剂中的溶解度。当光刻法处理抗蚀剂组合物时，可形成具有最小 LER 的图案。