The isopropylidenation of d-ribose diethyl dithioacetal and ribitol. A new synthesis of α- and β-d-ribofuranosylethyne via 2,3:4,5-di-O-isopropylidene-aldehydo-d-ribose
作者:Gaffar Aslani-Shotorbani、J.Grant Buchanan、Alan R. Edgar、Parvin K. Shahidi
DOI:10.1016/0008-6215(85)85184-3
日期:1985.2
Abstract The reaction of d -ribose diethyldithioacetal with acetone and sulphuric acid in the presence of anhydrous copper sulphate gives the 2,3:4,5-di-O-isopropylidene derivative 14 (40%) and the isomeric 2,5:3,4-di-O-isopropylidene acetal 17 (40%), contrary to the conclusions of some previous investigators. Earlier work on the structures of the mono-O-isopropylidene derivatives formed when copper
On stereochemistry of osmium tetroxide oxidation of allylic alcohol systems: empirical rule
作者:J.K. Cha、W.J. Christ、Y. Kishi
DOI:10.1016/s0040-4039(00)88231-3
日期:1983.1
An empirical formulation is presented to predict the stereochemistry of major osmylation products of allylic alcohols and their derivatives.
提出了一种经验公式来预测烯丙基醇及其衍生物的主要渗透作用产物的立体化学。
On stereochemistry of osmium tetraoxide oxidation of allylic alcohol systems. Empirical rule
作者:J.K. Cha、W.J. Christ、Y. Kishi
DOI:10.1016/0040-4020(84)80008-3
日期:1984.1
An empirical formulation is presented to predict the stereochemistry of major osmylation products of allylic alcohols and their derivatives.
提出了一种经验公式来预测烯丙基醇及其衍生物的主要渗透作用产物的立体化学。
Novel perfluoroalkylated oligo(oxyethylene) methyl ethers with high hemocompatibility and excellent co-emulsifying properties for potential biomedical uses
non-hydroxylated spacer was synthesized from allyl methyl ethers of oligo(oxyethylene) glycols using radical additions of perfluoroalkyl iodides and subsequent selective reductions of the C–I bond in the adducts in overall yields of 23–69%. Some of the novel amphiphilic compounds displayed very low hemolytic activity to erythrocytes and excellent co-emulsifying properties on testing on perfluorodecalin/Pluronic F-68
Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
申请人:Rohm and Haas Electronic Materials LLC
公开号:EP2472324A1
公开(公告)日:2012-07-04
Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.