The present invention provides a homogeneous process for hydrodehalogenating a halo-substituted C3-C20 heteroaryl starting material to form a non-halogenated C3-C20 heteroaryl product and/or a halo- substituted C3-C20 heteroaryl product, wherein the halo-substituted C3-C20 heteroaryl product has at least one less halogen substituents than the halo-substituted C3-C20 heteroaryl starting material, the process comprising the step of hydrogenating the halo-substituted C3-C20 heteroaryl starting material in the presence of a rhodium or ruthenium complex, molecular hydrogen, a base and a solvent, wherein the process is carried out in a monophasic solvent system and the molar ratio of base to each halogen substituent to be removed is at least 1 :1.
本发明提供了一种均相过程,用于将含卤代的C3-C20杂环起始物
水合脱卤,形成非卤代的C3-C20杂环产物和/或含卤代的C3-C20杂环产物,其中所述含卤代的C3-C20杂环产物比含卤代的C3-C20杂环起始物至少少一个卤素取代基,所述过程包括在
铑或
钌配合物、分子氢、碱和溶剂存在下
水合脱卤所述含卤代的C3-C20杂环起始物的步骤,其中所述过程在单相溶剂体系中进行,碱与每个待去除的卤素取代基的摩尔比至少为1:1。