MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150322027A1
公开(公告)日:2015-11-12
A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
A compound represented by formula (I):
wherein R
1
represents a hydrogen atom or a methyl group;
R
2
represents a C1-C12 hydrocarbon group;
X
a
and X
b
each independently represent an oxygen atom or a sulfur atom;
X
11
represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and
A
1
represents a C1-C12 divalent saturated hydrocarbon group or *-A
2
-X
1
-(A
3
-X
2
)
a
-A
4
-, where * represents a binding site to an oxygen atom, A
2
, A
3
and A
4
each independently represent a C1-C12 divalent hydrocarbon group, X
1
and X
2
each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.
Synthesis of two methacrylate monomers derivatives of carbonyl compounds: vanillin and acetone are presented. The obtained acetonyl methacrylate was used for copolymerization with methyl methacrylate. Copolymerizations were carried out in the presence of commercially available photoinitiator Irgacure 651. Thermal and mechanical properties of the copolymers with different concentration of acetonyl methacrylate were studied.
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
申请人:Kinsho Takeshi
公开号:US20060009602A1
公开(公告)日:2006-01-12
Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R
1
is H, methyl or trifluoromethyl, R
2
is a divalent hydrocarbon group, R
3
is H or a monovalent hydrocarbon group, or R
2
and R
3
, taken together, may form a ring, R
4
is H, OH or a monovalent hydrocarbon group, and R
5
is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions.