申请人:Dainippon Ink and Chemicals, Inc
公开号:US20020045674A1
公开(公告)日:2002-04-18
The invention relates to: 4-methylene-1,3-dioxolanes of the general formula (I)
1
wherein R1 denotes hydrogen, C
5
-C
6
-cycloalkyl or C
1
-C
4
-alkyl; m and n, which may be the same or different, denote 0 or 1, whereby m≦n, o denotes 2, 3 or 4 depending on the valency of the group X; and X denotes a C-C single bond, straight-chain or branched C
1
-C
18
-alkylene, C
5
-C
6
-cycloalkylene, C
8
-C
18
-arylalkylene, —CH
2
(OCH
2
CH
2
)
p
OCH
2
-, —CH
2
(OCH(CH
3
)CH
2
)
p
OCH
2
—, wherein p is an integer from 0 to 100; a process for their production; and intermediate products used. Moreover, compositions capable of emission-free, photocationic cross-linking, which comprise 4-methylene-1,3-dioxolanes of the general formula (I) and their use for the production of solvent-resistant and transparent films.
该发明涉及一般式(I)的4-亚甲基-1,3-二氧兰,其中R1代表氢、C5-C6-环烷基或C1-C4-烷基;m和n,可以相同也可以不同,代表0或1,其中m≤n,o取决于X基团的价性,o代表2、3或4;X代表C-C单键、直链或支链C1-C18-烷基、C5-C6-环烷基、C8-C18-芳基烷基、—CH2(OCH2CH2)pOCH2-、—CH2(OCH(CH3)CH2)pOCH2—,其中p为0至100的整数;以及它们的生产方法;和所用的中间产物。此外,还涉及能够无排放的光阳离子交联的组合物,包括一般式(I)的4-亚甲基-1,3-二氧兰,并且它们用于生产耐溶剂和透明薄膜。