[EN] PHOTOSTABLE CATIONIC ORGANIC SUNSCREEN COMPOUNDS AND COMPOSITIONS OBTAINED THEREFROM<br/>[FR] COMPOSES ECRANS SOLAIRES ORGANIQUES CATIONIQUES PHOTOSTABLES, ET COMPOSITIONS OBTENUES A PARTIR DE CEUX-CI
申请人:MERCK PATENT GMBH
公开号:WO2004020398A1
公开(公告)日:2004-03-11
Compounds of Formula (I) wherein R1 R1 and R2 are each independently hydrogen or linear or branched C1 to C10 alkyl, or linear or branched C1 to C10 alkoxy; R3 is selected from the group consisting of COCH3, CO2R7, CONH2, CON(R8)2, CN, COX(CH2)n-N-(R4)(R5)(R6), and the quaternized salt form of the formula COX(CH2)n-N-(R4)(R5)(R6)+Y-; X is O or NH; n is an integer of 1 to 5; Y is an anion; R4, R5 and R6 are independently linear or branched C1 to C30 alkyl; and R7 and R8 are independently hydrogen or linear or branched C1-C30 alkyl. Sunscreen formulations containing compounds of Formula (I), and methods for protecting hair, skin and substrates such as polymers, textiles, fabrics, leathers and paints using the compounds herein.
式(I)化合物,其中R1和R2分别独立地是氢或直链或支链的C1到C10烷基,或直链或支链的C1到C10烷氧基;R3从COCH3、CO2R7、CONH2、CON(R8)2、CN、COX(CH2)n-N-(R4)(R5)(R6)以及公式COX(CH2)n-N-(R4)(R5)(R6)+Y-的季铵盐形式中选择;X是O或NH;n是1到5的整数;Y是阴离子;R4、R5和R6独立地是直链或支链的C1到C30烷基;R7和R8独立地是氢或直链或支链的C1-C30烷基。含有式(I)化合物的防晒配方,以及使用这些化合物保护头发、皮肤和聚合物、纺织品、织物、皮革和涂料等基质的方法。