Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
申请人:Kinsho Takeshi
公开号:US20070218402A1
公开(公告)日:2007-09-20
Fluorine-containing silicon compounds having the general formula (1):
wherein X
1
, X
2
, and X
3
each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R
1
and R
2
are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R
1
and R
2
may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.
具有通式(1)的含氟硅化合物:
其中X1、X2和X3分别为氢、羟基、卤素、1至6个碳原子的直链、支链或环烷氧基,或具有1至20个碳原子的直链、支链、环状或多环骨架的一价有机基团,Y为二价有机基团,R1和R2分别独立地为氢或具有1至20个碳原子的直链、支链、环状或多环骨架的一价有机基团,或者R1和R2可以结合在一起形成一个环,与它们附着的碳原子结合。从式(1)的化合物中获得的硅树脂具有适当的酸度,可在最小化模式坍塌的情况下形成更细的模式,当用于光阻组合物时发生膨胀。