PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME
申请人:OH Jung Hoon
公开号:US20120203030A1
公开(公告)日:2012-08-09
A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided.
wherein in the formula (1), Y, X, R
1
, R
2
, n
1
, n
2
and A
+
have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
提供以下式子(1)所代表的光酸发生剂,制备该光酸发生剂的方法以及含有该光酸发生剂的抗蚀剂组合物。在式子(1)中,Y、X、R1、R2、n1、n2和A+的含义与发明的详细说明中定义的含义相同。该光酸发生剂可以在ArF液体浸入光刻时保持适当的接触角,可以减少液体浸入光刻时发生的缺陷,并具有优异的溶解度和树脂的优异相容性。此外,该光酸发生剂可以通过使用工业上易得的环氧化合物的高效简单方法制备。