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全氟十三酸 | 72629-94-8

中文名称
全氟十三酸
中文别名
——
英文名称
perfluorotridecanoic acid
英文别名
2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13-pentacosafluorotridecanoic acid
全氟十三酸化学式
CAS
72629-94-8
化学式
C13HF25O2
mdl
——
分子量
664.11
InChiKey
LVDGGZAZAYHXEY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    112-123 °C (lit.)
  • 沸点:
    260.7±35.0 °C(Predicted)
  • 密度:
    1.773±0.06 g/cm3(Predicted)
  • 溶解度:
    乙醇:微溶

计算性质

  • 辛醇/水分配系数(LogP):
    8.3
  • 重原子数:
    40
  • 可旋转键数:
    11
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.92
  • 拓扑面积:
    37.3
  • 氢给体数:
    1
  • 氢受体数:
    27

安全信息

  • 安全说明:
    S22,S24/25
  • WGK Germany:
    3

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    全氟十三酸吡啶氯化亚砜 作用下, 反应 4.0h, 生成 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13-Pentacosafluorotridecanoyl chloride
    参考文献:
    名称:
    Conformational Analysis of Single Perfluoroalkyl Chains by Single-Molecule Real-Time Transmission Electron Microscopic Imaging
    摘要:
    Whereas a statistical average of molecular ensembles has been the conventional source of information on molecular structures, atomic resolution movies of single organic molecules obtained by single-molecule real-time transmission electron microscopy have recently emerged as a new tool to study the time evolution of the structures of individual molecules. The present work describes a proof-of-principle study of the determination of the conformation of each C-C bond in single perfluoroalkyl fullerene molecules encapsulated in a single-walled carbon nanotube (CNT) as well as those attached to the outer surface of a carbon nanohorn (CNH). Analysis of 82 individual molecules in CNTs under a 120 kV electron beam indicated that 6% of the CF2-CF2 bonds and about 20% of the CH2-CH2 bonds in the corresponding hydrocarbon analogue are in the gauche conformation. This comparison qualitatively matches the known conformational data based on time- and molecular-average as determined for ensembles. The transmission electron microscopy images also showed that the molecules entered the CNTs predominantly in one orientation. The molecules attached on a CNH surface moved more freely and exhibited more diverse conformation than those in a CNT, suggesting the potential applicability, of this method for the determination of the dynamic shape of flexible molecules and of detailed conformations. We observed little sign of any decomposition of the specimen molecules, at least up to 10(7) e.nm(-2) (electrons/nm(2)) at 120 kV acceleration voltage. Decomposition of CNHs under irradiation with a 300 kV electron beam was suppressed by cooling to 77 K, suggesting that the decomposition is a chemical process. Several lines of evidence suggest that the graphitic substrate and the attached molecules are very cold.
    DOI:
    10.1021/ja411235x
  • 作为产物:
    参考文献:
    名称:
    全氟烷磺酸的氧化阳极碘氟氟烷。制备去新贵酯sulfoniques totalement fluoresř ˚F SO 3 R” ˚F一个longues CHAINES
    摘要:
    全氟化磺酸酯[R ˚F SO 3 R ' ˚F和fluorosulphates FSO 3 R' ˚F,很容易被iodoperfluoroalkanes的阳极氧化得到的R” ˚F我在全氟链烷磺酸类R ˚F SO 3 H(R ˚F CF 3,C 2 ˚F 5,C 4 F 9)和氟代硫酸。使用二碘化合物I(CF 2)4 I,可以选择性地获得单和二酯。这些酯的碱水解产生全氟化的羧酸化合物。多氟碘化物R'F CH 2 CH 2 I在类似条件下也会被氧化。讨论了电解反应的机理。
    DOI:
    10.1016/s0040-4020(01)92420-2
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文献信息

  • PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
    申请人:Wada Kenji
    公开号:US20100233617A1
    公开(公告)日:2010-09-16
    A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.
    一种感光组合物包括:(A)含有与下式(I)所表示的化合物对应的重复单元的树脂;该树脂能够在受到光敏射线或辐射照射后产生酸基团:Z-A-X—B—R   (I)其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团;A代表一个烷基基团;X代表一个单键或含杂原子的二价连接基团;B代表一个单键、一个氧原子或—N(Rx)-;Rx代表一个氢原子或一个一价有机基团;R代表一个通过Y取代的一价有机基团;当B代表—N(Rx)-时,R和Rx可以结合在一起形成一个环;Y代表一个可聚合的基团。
  • SILICA PARTICLES COATED WITH BETA-CYCLODEXTRIN FOR THE REMOVAL OF EMERGING CONTAMINANTS FROM WASTEWATER
    申请人:TEMPLE UNIVERSITY - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION
    公开号:US20140231352A1
    公开(公告)日:2014-08-21
    Provided is a silica particle coated with β-cyclodextrin, wherein said cyclodextrin is attached to said silica particle via at least one crosslinking agent and/or at least one copolymer. Also provided are methods of removing contaminants from a flowing or stationary liquid phase comprising the step of contacting said liquid phase with the silica particle coated with β-cyclodextrin.
    提供的是涂有β-环糊精的二氧化硅颗粒,其中所述环糊精通过至少一种交联剂和/或至少一种共聚物连接到所述二氧化硅颗粒上。还提供了一种从流动或静止液相中去除污染物的方法,包括将所述液相与涂有β-环糊精的二氧化硅颗粒接触的步骤。
  • PROCESS FOR PRODUCING ESTER COMPOUND
    申请人:Imazeki Shigeaki
    公开号:US20100324314A1
    公开(公告)日:2010-12-23
    PROBLEM To provide an environmentally-friendly method for producing industrially an ester compound. SOLUTION The present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.
    问题提供一种生产工业酯化合物的环保方法。 解决方案是一种生产酯化合物的方法,包括将羧酸和醇经过脱水缩合反应,使用一种不挥发的酸催化剂,然后通过将弱碱性物质与残留的酸催化剂接触来去除残留的酸催化剂。
  • Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
    申请人:Yamaguchi Shuhei
    公开号:US20120237874A1
    公开(公告)日:2012-09-20
    According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)
    根据一种实施例,一种感光射线或辐射敏感的树脂组合物包括以下任何一种化合物(A),该化合物在暴露于感光射线或辐射时会产生酸和树脂(B),其溶解速度在碱性显影剂的作用下会增加。 (通式(I)中使用的字符具有描述中提到的含义。)
  • PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
    申请人:Enomoto Yuichiro
    公开号:US20120282548A1
    公开(公告)日:2012-11-08
    Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
    提供的是一种形成图案的方法,包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤,(ii)曝光薄膜的步骤,以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤,其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂,(B)一种能够在光致或辐射照射下生成酸的化合物,(D)一种溶剂,以及(G)一种具有氟原子和硅原子中的至少一种,并具有碱性或能够通过酸的作用增加碱性的化合物。
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