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5-isopropyl-4-methyl-dihydrofuran-2(3H)-one

中文名称
——
中文别名
——
英文名称
5-isopropyl-4-methyl-dihydrofuran-2(3H)-one
英文别名
3-methyl-4-i-propyl-γ-butyrolactone;4-Methyl-5-propan-2-yloxolan-2-one
5-isopropyl-4-methyl-dihydrofuran-2(3H)-one化学式
CAS
——
化学式
C8H14O2
mdl
——
分子量
142.198
InChiKey
VZCKPIXXIZDDDT-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2
  • 重原子数:
    10
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.88
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    巴豆酸甲酯异丁醛 在 samarium diiodide 作用下, 以 四氢呋喃叔丁醇 为溶剂, 反应 5.0h, 生成 5-isopropyl-4-methyl-dihydrofuran-2(3H)-one
    参考文献:
    名称:
    An asymmetric, SmI2-mediated approach to γ-butyrolactones using a new, fluorous-tagged auxiliary
    摘要:
    A new, fluorous-tagged chiral auxiliary has been developed for the asymmetric, SmI2-mediated coupling of aldehydes and alpha,beta-unsaturated esters. gamma-Butyrolactones are obtained in moderate to good isolated yield and in high enantiomeric excess. The fluorous tag allows the auxiliary to be conveniently recovered by fluorous solid-phase extraction (FSPE) and reused. (C) 2008 Elsevier Ltd. All rights reserved.
    DOI:
    10.1016/j.tet.2008.08.110
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文献信息

  • Wang, Siu Ling B.; Su, Jing; Wulff, William D., Journal of the American Chemical Society, 1992, vol. 114, # 26, p. 10665 - 10666
    作者:Wang, Siu Ling B.、Su, Jing、Wulff, William D.、Hoogsteen, Karst
    DOI:——
    日期:——
  • Shono, Tatsuya; Matsumura, Yoshihiro; Kashimura, Shigenori, Journal of Chemical Research, Miniprint, 1984, # 7, p. 1922 - 1935
    作者:Shono, Tatsuya、Matsumura, Yoshihiro、Kashimura, Shigenori
    DOI:——
    日期:——
  • YAMAGUCHI, MASAHIKO;HIRAO, ICHIRO, CHEM. LETT., 1985, N 3, 337-338
    作者:YAMAGUCHI, MASAHIKO、HIRAO, ICHIRO
    DOI:——
    日期:——
  • PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
    申请人:JSR CORPORATION
    公开号:US20150004545A1
    公开(公告)日:2015-01-01
    A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R 1 , R 2 , R 3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR a —. R a represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A − represents —SO 3 − or —CO 2 − . M + represents a monovalent onium cation.
  • US9477149B2
    申请人:——
    公开号:US9477149B2
    公开(公告)日:2016-10-25
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