申请人:JSR CORPORATION
公开号:US20150004545A1
公开(公告)日:2015-01-01
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R
1
, R
2
, R
3
and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR
a
—. R
a
represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A
−
represents —SO
3
−
or —CO
2
−
. M
+
represents a monovalent onium cation.