[EN] DEGRADABLE HYDRAZONE CURING AGENTS AND APPLICATIONS THEREOF<br/>[FR] AGENTS DE DURCISSEMENT À BASE D'HYDRAZONE DÉGRADABLE ET LEURS APPLICATIONS
申请人:ADESSO ADVANCED MATERIALS WUXI CO LTD
公开号:WO2015043462A1
公开(公告)日:2015-04-02
This invention provides, among others, curing agents of Formulae (I) and (II), methods for preparing these curing agents, prepreg materials, degradable cross-linked polymers and reinforced composites made from these curing agents and epoxy resins, and methods for degrading and/or recycling the degradable polymers and reinforced composites.
Chemoselective Oxidation of Sulfides to Sulfoxides Using<i>N</i>-<i>t</i>-Butyl-<i>N</i>-chlorocyanamide
作者:Vinod Kumar、Mahabir Parshad Kaushik
DOI:10.1246/cl.2005.1230
日期:2005.9
A simple, efficient and highly chemoselective method has been developed for the synthesis of sulfoxides from sulfides using N-t-butyl-N-chlorocyanamide as an oxidant in a mixed acetonitrile–water solution with a 1:1 mol ratio of oxidant to sulfides. N-t-butyl-N-chlorocyanamide, a source of positive chlorine, has been used for conversion of the variety of sulfides into their corresponding sulfoxides in quantitative yields.
A facile α-arylation of nitriles has been developed by simply introducing Tf2O and DABCO to the mixture of nitriles and aryl sulfoxides. The transformation consists of two sequential steps: (i) Tf2O-initiated electrophilic assembly and and (ii) DABCO-triggered rearrangement. Each step can be tuned independently by changing the temperature and/or base. This adjustability allows the method to accommodate
A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided.
An aromatic sulfonium salt compound represented by the General Formula (I) below:
(wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below).
Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.
Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
申请人:Adeka Corporation
公开号:EP2308865A1
公开(公告)日:2011-04-13
Novel aromatic sulfonium salt compounds of general formula (I), photo-acid generators comprising the same, and photo-polymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy and can be employed for wide usage, such as photoresist and ink for foods-packing medium, since the release of benzene is suppressed; and a stereolithographic process, using said stereolithographic resin composition.