(1-甲氧基萘-2-基)-苯基甲酮 | 43073-56-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: (1-甲氧基萘-2-基)-苯基甲酮
• 英文名称: 2-benzoyl-1-methoxynaphthalene
• 英文别名: 1-Methoxy-2-benzoylnaphthalin；2-Benzoyl-1-methoxynaphthalin；(1-methoxy-[2]naphthyl)-phenyl ketone；(1-Methoxy-[2]naphthyl)-phenyl-keton；Methanone, (1-methoxy-2-naphthalenyl)phenyl-；(1-methoxynaphthalen-2-yl)-phenylmethanone
• CAS: 43073-56-9
• 化学式: C₁₈H₁₄O₂
• 分子量: 262.308
• InChiKey: SPQHXDSOURKIHQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.06
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-溴苯酚 、 (1-甲氧基萘-2-基)-苯基甲酮 在 2-(naphthalen-2-yl)-2,3-dihydrobenzo[d]thiazole 、 (R_a)-4-hydroxy-2,6-bis(2,4,6-tricyclohexylphenyl)dinaphtho-[1,3,2]dioxaphosphepine 4-oxide 、 叔丁基锂 作用下， 以 四氢呋喃 、 1,2-二氯乙烷 、 正戊烷 为溶剂， 反应 50.0h， 生成 (R)-4-((1-methoxynaphthalen-2-yl)(phenyl)methyl)phenol
  参考文献：
  名称：

  对醌甲基化物有机催化转移加氢对映选择性合成三芳基甲烷

  摘要：

  开发了一种新的有机催化不对称合成对映体富集的三芳基甲烷的方法。与传统的不对称芳基化方法不同，本研究采用通过C-H 键形成的不对称还原作为关键步骤。这种方法不需要杂芳环的存在或不稳定的对醌甲基化物的预合成。取而代之的是，稳定的外消旋三芳基甲醇被用作底物，用于用合适的手性磷酸催化剂原位生成中间体。

  DOI：

  10.1039/d2cc01996e
• 作为产物：
  描述：

  1-Methoxynaphthalin-2-carbonsaeurechlorid 在 ammonium hydroxide 、 乙醚 、 五氯化磷 作用下， 生成 (1-甲氧基萘-2-基)-苯基甲酮
  参考文献：
  名称：

  Richtzenhain; Nippus, Chemische Berichte, 1949, vol. 82, p. 408,414

  摘要：

  DOI：

文献信息

• Directing Zeolite Structures into Hierarchically Nanoporous Architectures
  作者：Kyungsu Na、Changbum Jo、Jeongnam Kim、Kanghee Cho、Jinhwan Jung、Yongbeom Seo、Robert J. Messinger、Bradley F. Chmelka、Ryong Ryoo

  DOI：10.1126/science.1204452

  日期：2011.7.15

  catalytic activity. Crystalline mesoporous molecular sieves have long been sought as solid acid catalysts for organic reactions involving large molecules. We synthesized a series of mesoporous molecular sieves that possess crystalline microporous walls with zeolitelike frameworks, extending the application of zeolites to the mesoporous range of 2 to 50 nanometers. Hexagonally ordered or disordered mesopores

  双功能表面活性剂用于合成具有多种孔隙率和增强催化活性的沸石。长期以来，人们一直在寻找结晶中孔分子筛作为涉及大分子的有机反应的固体酸催化剂。我们合成了一系列具有类似沸石骨架的结晶微孔壁的介孔分子筛，将沸石的应用扩展到2至50纳米的介孔范围。六边形有序或无序中孔由表面活性剂聚集体产生，而表面活性剂头基中的多个阳离子部分指导微孔铝硅酸盐骨架的结晶。壁厚、骨架拓扑结构和中孔尺寸可以用不同的表面活性剂控制。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
  申请人：TOKYO ELECTRON LIMITED

  公开号：US10025187B2

  公开（公告）日：2018-07-17

  A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).

  根据本发明，一种光敏化学放大型抗蚀剂材料用于两阶段曝光光刻工艺，它包含(1)可显影碱成分和(2)通过曝光产生光敏剂和酸的成分。在由(a)酸-光敏剂发生器、(b)光敏剂前体和(c)光酸发生器组成的三个组件中，上述组件只包含(a)组件、任意两个组件或(a)至(c)的所有组件。
• QUANTUM DOT COMPOSITION, COLOR CONVERSION FILM AND BACKLIGHT MODULE
  申请人：Nano Precision Taiwan Limited

  公开号：US20220033707A1

  公开（公告）日：2022-02-03

  A quantum dot composition includes a matrix resin, a quantum dot phosphor, and a polysilane polymer. The matrix resin includes epoxy-fluorene copolymer acrylic resin represented by Formula 1: Formula 1. In Formula 1, R 1 and R 4 each is independently hydrogen or a C1-C12 long alkyl carbon chain. R 2 and R 3 each is independently a is an integer from 1 to 10, and b and c each is independently an integer from 0 to 10. X is 0.1 to 0.9. A color conversion film including the quantum dot composition and a backlight module using the color conversion film are also provided.