申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06274286B1
公开(公告)日:2001-08-14
A chemically amplified positive resist composition comprising at least one basic compound of the following general formula (1) or (2):
wherein R1, R2, R3, R7, and R8 are independently normal, branched or cyclic alkylene groups having 1 to 20 carbon atoms, R4, R5, R6, R9, and R10 are independently hydrogen, alkyl groups having 1 to 20 carbon atoms or amino groups, R4 and R5, R5 and R6, R4 and R6, or R8, R5 and R5, and R9 and R10, taken together, may form a ring, letters k, m and n are integers of 0 to 20, with the proviso that hydrogen is excluded from R4, R5, R6, R9 and R10 when k, m or n is equal to 0.
The resist compositions of the present invention are effective for preventing resist films from thinning and for increasing the focus margin of an isolated pattern.
一种化学增感正光刻胶组合物,包括下列通式(1)或(2)中至少一种碱性化合物:其中,R1、R2、R3、R7和R8分别独立地表示1至20个碳原子的正常、支链或环烷基,R4、R5、R6、R9和R10分别独立地表示氢、1至20个碳原子的烷基或氨基,R4和R5、R5和R6、R4和R6、或R8、R5和R5、R9和R10共同形成一个环,字母k、m和n是0至20的整数,但当k、m或n等于0时,R4、R5、R6、R9和R10中排除氢。本发明的光刻胶组合物对于防止光刻胶薄化和增加孤立图案的焦点余量是有效的。