1-丁氧基-1-甲氧基丁烷 | 113443-65-5

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 1-丁氧基-1-甲氧基丁烷
• 英文名称: 1-n-butoxy-1-methoxybutane
• 英文别名: 1-butoxy-1-methoxybutane
• CAS: 113443-65-5
• 化学式: C₉H₂₀O₂
• 分子量: 160.257
• InChiKey: MPAZMSQJQTWSJW-UHFFFAOYSA-N

物化性质

• 沸点：
  173.6±8.0 °C(Predicted)
• 密度：
  0.842±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  11
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  二丁醚 、 甲醇 以26%的产率得到
  参考文献：
  名称：

  GINZEL, KLAUS-DIETER;STECKHAN, EBERHARD, TETRAHEDRON, 43,(1987) N 24, 5797-5805

  摘要：

  DOI：

文献信息

• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• Indirect electrochemical α-methoxylation of aliphatic ethers and acetals - reactivity and regioselectivity of the anodic oxidation using tris(2,4-dibromophenyl)amine as redox catalyst
  作者：Klaus-Dieter Ginzel、Eberhard Steckhan、Dieter Degner

  DOI：10.1016/s0040-4020(01)87786-3

  日期：——

  technically important α-methoxylation of aliphatic ethers and acetals to form mixed acetals respectively aldehydes or ortho-esters can be performed electrochemically at low potentials in methanol solution using an undivided cell and tris(2,4-dibromophenyl)amine as redox catalyst. The regioselectivity is usually considerably higher as compared with direct electrolysis in the absence of a catalyst. Especially

  脂族醚和缩醛分别形成醛或原酸酯的混合缩醛的技术上重要的α-甲氧基化反应可以在甲醇溶液中以低电位电化学进行，使用三分（2,4-二溴苯基）胺作为氧化还原催化剂。与在不存在催化剂的情况下进行直接电解相比，区域选择性通常要高得多。特别有价值的是在伯或叔碳原子和1，3-二氧戊环中的缩醛碳存在下仲碳原子的区域选择性甲氧基化的方法。氧化还原催化剂在反应条件下是稳定的，因此可以获得超过一千的营业额。
• Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
  申请人：Komoriya Haruhiko

  公开号：US20110244188A1

  公开（公告）日：2011-10-06

  Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

  本发明涉及一种可聚合的含氟单体，其通式（1）如下所示。其中，R1代表氢原子、甲基基团、氟原子或三氟甲基基团。n为0或1的整数，m为1至（3+n）的整数。R2和R3各自独立地代表氢原子或保护基团。通过聚合或共聚合该单体得到的含氟聚合物的抗蚀剂适用于浸润曝光或基于浸润曝光的双重图案化工艺的微细加工。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
  申请人：Mori Kazunori

  公开号：US20120077126A1

  公开（公告）日：2012-03-29

  A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 8 represents a substituted or unsubstituted alkyl group or the like; and W 1 represents a single bond, a substituted or unsubstituted methylene group or the like.

  本发明的含氟聚合物包含通式（2）的重复单元（a），其具有1,000至1,000,000的质量平均分子量。该聚合物适用于抗高能辐射（波长小于或等于300nm的高能射线辐射或电子束辐射）的光阻组合物，或用于液体浸没光刻的面涂层组合物，并具有高水珠性，尤其是高后退接触角。在公式中，R1表示可聚合的双键含有的基团；R2表示氟原子或含氟烷基；R8表示取代或未取代的烷基或类似物；W1表示单键，取代或未取代的亚甲基或类似物。
• Top Coat Composition
  申请人：Komoriya Haruhiko

  公开号：US20110245395A1

  公开（公告）日：2011-10-06

  Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R 2 or R 3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

  公开了一种用于光刻胶的面漆组合物，其特征在于包含有一个由通式（5）表示的重复单元的氟化聚合物。在该式中，R1表示氢原子、甲基、氟原子或三氟甲基；n表示0或1；m表示1至（3+n）的整数；而R2或R3表示氢原子或保护基。该面漆组合物在显影液中具有适当的溶解度。