Amine compounds, resist compositions and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06743564B2
公开(公告)日:2004-06-01
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
Synthetic Reactions by Complex Catalysts XXVIII. Reaction of β-Propiolactone with Alkyl Halide Caused by Cu<sub>2</sub>O-Isonitrile Complex
作者:Takeo Saegusa、Ichiki Murase、Michio Nakai、Yoshihiko Ito
DOI:10.1246/bcsj.45.3604
日期:1972.12
β-propiolactone (BPL) caused by the Cu2O-isonitrile complex in the presence of alkylhalide was studied, and an oligomeric mixture of acrylate derivatives 3 (n=1, 2 and 3 in Eq. (3)) was isolated in fairly high yields. The complex catalyst showed a distinguished catalytic activity for the oligomerization of BPL. The reaction mechanism involving an intermediate of organocopper(I) isonitrile 4, which is