2,6,8-三甲基-4-壬酮 | 1331-50-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 2,6,8-三甲基-4-壬酮
• 英文名称: Trimethyl nonanone
• 英文别名: 3,4,5-trimethylnonan-2-one
• CAS: 1331-50-6
• 化学式: C₁₂H₂₄O
• 分子量: 184.32
• InChiKey: PKNKULBDCRZSBT-UHFFFAOYSA-N

物化性质

• 熔点：
  -74.9°C
• 沸点：
  243.3°C (estimate)
• 密度：
  0.8170

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID
  申请人：JSR CORPORATION

  公开号：US20200341376A1

  公开（公告）日：2020-10-29

  A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A 1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

  一种辐射敏感树脂组合物包含：包括含有酸敏感基团的结构单元的聚合物；和辐射敏感酸发生剂。辐射敏感酸发生剂包括磺酸根离子和辐射敏感阳离子。磺酸根离子包括两个或两个以上的环，以及一个碘原子和一个含有0至10个碳原子的一价基团，其中该基团至少包括一个氧原子和一个氮原子，与两个或两个以上的环中的至少一个结合。环最好是芳香环。辐射敏感酸发生剂最好是由式（1）表示的化合物。在式（1）中，A1表示通过去除环上（p+q+r+1）个氢原子而获得的由含有3至20个环原子的环的化合物得到的基团。
• [EN] PROCESS FOR PREPARING CYCLIC ESTERS AND CYCLIC AMIDES<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ESTERS CYCLIQUES ET D'AMIDES CYCLIQUES
  申请人：TOTAL RES & TECHNOLOGY FELUY

  公开号：WO2014122294A1

  公开（公告）日：2014-08-14

  The invention relates to a process for preparing a cyclic ester or a cyclic amide, comprising the step of: contacting at least one hydroxycarboxylic acid and/or at least one amino-carboxylic acid; or an ester, or salt thereof; wherein said hydroxycarboxylic acid is a 2-hydroxycarboxylic acid,or a 6–hydroxycarboxylic acid; and wherein said amino carboxylic acid is a 2-amino-carboxylic acid or a 6-amino-carboxylic acid; with at least one acidic zeolite comprising: - two or three interconnected and non-parallel channel systems, wherein at least one of said channel systems comprises 10-or more-membered ring channels; and a framework Si/X2 ratio of at least 24 as measured by NMR; or - three interconnected and non-parallel channel systems, wherein at least two of said channel systems comprise 10-or more-membered ring channels; and a framework Si/X2 ratio of at least 6 as measured by NMR; wherein each X is Al or B, and wherein the process is performed at a pressure between 0.5 and 20 bar.

  该发明涉及一种制备环酯或环酰胺的过程，包括以下步骤：接触至少一种羟基羧酸和/或至少一种氨基羧酸；或其酯或盐；其中所述羟基羧酸是2-羟基羧酸或6-羟基羧酸；所述氨基羧酸是2-氨基羧酸或6-氨基羧酸；与至少一种含有酸性沸石的接触：- 两个或三个相互连接且非平行的通道系统，其中至少一个通道系统包括10个或更多环成员的环通道；并且通过NMR测量的框架Si/X2比至少为24；或- 三个相互连接且非平行的通道系统，其中至少两个通道系统包括10个或更多环成员的环通道；并且通过NMR测量的框架Si/X2比至少为6；其中每个X是Al或B，并且该过程在0.5至20巴的压力下进行。
• PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20210181627A1

  公开（公告）日：2021-06-17

  A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [M m L n Q p ]  (1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R 1 —CHR 3 —R 2 (2) In the formula (2), R 1 and R 2 each independently represent —C(═O)—R A , —C(═O)—OR B , or —CN.

  一种图案形成方法包括：在基板上直接或间接地涂覆含有复合物和有机溶剂的辐射敏感组合物以形成膜；将膜暴露于紫外线、远紫外线、极紫外线或电子束；和显影所暴露的膜，其中该复合物由式（1）表示。[MmLnQp] (1)在式（1）中，M代表锌原子、钴原子、镍原子、铪原子、锆原子、钛原子、铁原子、铬原子、锰原子或铟原子；L代表来自由式（2）表示的化合物的配体。R1—CHR3—R2(2)在式（2）中，R1和R2分别独立地表示—C(═O)—RA、—C(═O)—ORB或—CN。
• [EN] NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME<br/>[FR] NOUVEAU COMPOSÉ, MATÉRIAU SEMI-CONDUCTEUR, PROCÉDÉS DE FABRICATION DE REVÊTEMENT ET SEMI-CONDUCTEUR L'UTILISANT
  申请人：MERCK PATENT GMBH

  公开号：WO2018115043A1

  公开（公告）日：2018-06-28

  An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.

  提供一种在溶剂中具有高溶解性且具有有利的填充性能、高耐热性和/或高耐蚀性的半导体材料和涂层是一个目标。另一个目标是提供一种使用该半导体材料制造半导体的方法。还有一个目标是提供一种新型化合物。提供的是：由特定芳香烃环衍生物组成的半导体材料；使用该半导体材料制造涂层和半导体的方法；以及由特定芳香烃环衍生物组成的化合物。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20180319740A1

  公开（公告）日：2018-11-08

  A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R 1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R 1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R 2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R 3 represents a second acid-labile group.

  一种辐射敏感性树脂组合物包括第一聚合物，其中包括第一个酸敏感基团的第一个结构单元；辐射敏感性酸发生剂；以及由式（1）表示的化合物。n为1或2。当n为1时，R1代表氢原子或具有1至20个碳原子的一价有机基团。当n为2时，R1代表具有1至20个碳原子的二价有机基团。R2代表氢原子或具有1至20个碳原子的一价有机基团。E代表由式（i）表示的基团。R2和E可能一起表示具有3至20个环原子的环结构，与氮原子一起。X代表具有1至20个碳原子的二价有机基团。R3代表第二个酸敏感基团。