[EN] PHOTOPATTERNABLE MATERIALS AND RELATED ELECTRONIC DEVICES AND METHODS<br/>[FR] MATÉRIAUX À MOTIFS FORMÉS PAR PHOTOEXPOSITION, ET DISPOSITIFS ÉLECTRONIQUES ET PROCÉDÉS ASSOCIÉS
申请人:POLYERA CORP
公开号:WO2015009768A1
公开(公告)日:2015-01-22
The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, they can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.